TOP > 外国特許検索 > POLISHING METHOD AND POLISHING APPARATUS

POLISHING METHOD AND POLISHING APPARATUS

外国特許コード F070001774
整理番号 F070001774
掲載日 2008年1月11日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2006JP323774
国際公開番号 WO 2007/063873
国際出願日 平成18年11月29日(2006.11.29)
国際公開日 平成19年6月7日(2007.6.7)
優先権データ
  • 特願2005-345688 (2005.11.30) JP
発明の名称 (英語) POLISHING METHOD AND POLISHING APPARATUS
発明の概要(英語) Provided is a polishing apparatus which can polish hard-to-process material, such as SiC, at a high efficiency, into a high quality plane. The polishing apparatus is provided with a bell jar (20) filled with a gas including oxygen at a pressure higher than the atmospheric pressure; a pad (22) which relatively moves in contact with a processing object (25) in the bell jar (20) and polishes the processing object; slurry supplying means (31, 24) for supplying a pad surface in contact with the processing object with a slurry including a photocatalyst; and an ultraviolet light source (35) for irradiating inside the bell jar with ultraviolet. The photocatalyst included in the slurry generates active oxygen by receiving ultraviolet irradiation in the bell jar filled with the high pressure gas including oxygen. Since the active oxygen weakens (or cuts) the strong atomic bond of the processing object, polishing efficiency of pad is improved. Even when the hard-to-process material, such as SiC, is to be processed, highly efficient and high quality polishing is performed.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • National University Corporation Saitama University
  • 発明者(英語)
  • Doi, Toshiro
  • Watanabe, Shigeru
国際特許分類(IPC)
指定国 AE AG AL AM AT AU AZ BA BB BE BF BG BJ BR BW BY BZ CA CF CG CH CI CM CN CO CR CU CY CZ DE DK DM DZ EC EE EG ES FI FR GA GB GD GE GH GM GN GQ GR GT GW HN HR HU ID IE IL IN IS IT JP KE KG KM KN KP KR KZ LA LC LK LR LS LT LU LV LY MA MC MD MG MK ML MN MR MW MX MY MZ NA NE NG NI NL NO NZ OM PG PH PL PT RO RS RU SC SD SE SG SI SK SL SM SN SV SY SZ TD TG TJ TM TN TR TT TZ UA UG US UZ VC VN ZA ZM ZW
ライセンスをご希望の方、特許の内容に興味を持たれた方は、「問合せ先」まで直接お問合せ下さい。

PAGE TOP

close
close
close
close
close
close