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DEVICE FOR NONDESTRUCTIVELY EXAMINING COMPOSITE STRUCTURE AND NONDESTRUCTIVE EXAMINATION METHOD コモンズ 新技術説明会

外国特許コード F100002342
整理番号 295PCT-JP
掲載日 2010年12月15日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2009JP053140
国際公開番号 WO 2009/107575
国際出願日 平成21年2月23日(2009.2.23)
国際公開日 平成21年9月3日(2009.9.3)
優先権データ
  • 特願2008-043595 (2008.2.25) JP
発明の名称 (英語) DEVICE FOR NONDESTRUCTIVELY EXAMINING COMPOSITE STRUCTURE AND NONDESTRUCTIVE EXAMINATION METHOD コモンズ 新技術説明会
発明の概要(英語) A device for nondestructively examining the inside of the surface layer of a composite structure by using muons of cosmic rays and a nondestructive examination method are disclosed. The device is used for examining the inside of the surface layer of a composite structure (11) by using muons (12) of cosmic rays traveling generally horizontally and having spins polarized by predetermined degrees in the traveling direction. The device includes a positron/electron amount detecting means (13) for detecting the amount of positrons/electrons having characteristic time constants and reflected/emitted in the opposite direction to the direction of application of muons (12) when muons (12) which come to rest inside the composite structure (11) annihilate and radiography data processing means (14, 15, 16) for processing data relating to the state of a second substance (11-2) different from a first substance (11-1) of the surface layer present inside the surface layer of the composite structure (11) according to the detected amount of positrons/electron and outputting the state of the second substance (11-2) as a radiograph.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • INTER-UNIVERSITY RESEARCH INSTITUTE CORPORATION HIGH ENERGY ACCELERATOR RESEARCH ORGANIZATION
  • 発明者(英語)
  • NAGAMINE, Kanetada
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW(UTILITY MODEL),BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM(UTILITY MODEL),DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN,HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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