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MULTIWELL INCUBATION APPARATUS AND METHOD OF ANALYSIS USING THE SAME

外国特許コード F110002441
整理番号 S2006-0837-C0
掲載日 2011年3月4日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2007JP000409
国際公開番号 WO 2007/122814
国際出願日 平成19年4月13日(2007.4.13)
国際公開日 平成19年11月1日(2007.11.1)
優先権データ
  • 特願2006-110713 (2006.4.13) JP
発明の名称 (英語) MULTIWELL INCUBATION APPARATUS AND METHOD OF ANALYSIS USING THE SAME
発明の概要(英語) A continuous temperature-gradient incubation apparatus designed to solve the problem of moving of liquid vapor generated on the side of high temperature toward the side of low temperature to thereby cause condensation. There is provided a multiwell incubation apparatus having a well-housing vessel made of a heat conducting material and, detachably housed therein, liquid-storing wells lined in transverse rows and longitudinal rows, the multiwell incubation apparatus fitted with a liquid or gas flow channel or bath for supply of a gas saturated with the vapor of the liquid and having incubation temperatures differing between individual well transverse rows with a given temperature difference, the temperatures realizing a temperature series forming a given temperature difference along the longitudinal rows, characterized in that a heat source for realizing the lowest temperature of the given temperature series is installed outside the well rows and along the wells lined on the transverse row of one side of the housing vessel, and that another heat source for realizing the highest temperature of the given temperature series is installed outside the well rows and along the side opposite to the above one side, and that a separator is installed on each transverse row of identical temperature.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • RESEARCH ORGANIZATION OF INFORMATION AND SYSTEMS
  • 発明者(英語)
  • SHIMAMOTO, Nobuo
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH,BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH,GM,GT,HN,HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM,PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,SV,SY,TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN,ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HU,IE,IS,IT,LT,LU,LV,MC,MT,NL,PL,PT,RO,SE,SI,SK,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW,GH,GM,KE,LS,MW,MZ,NA,SD,SL,SZ,TZ,UG,ZM,ZW),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)

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