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METHOD AND APPARATUS FOR PROCESSING EXHAUST GAS

外国特許コード F110002508
整理番号 S2007-0392-C0
掲載日 2011年3月14日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2008JP052558
国際公開番号 WO 2008/102708
国際出願日 平成20年2月15日(2008.2.15)
国際公開日 平成20年8月28日(2008.8.28)
優先権データ
  • 特願2007-041449 (2007.2.21) JP
発明の名称 (英語) METHOD AND APPARATUS FOR PROCESSING EXHAUST GAS
発明の概要(英語) Disclosed are a method and an apparatus for processing an exhaust gas, which enable to suppress decrease of pH and increase of ORP of a mixture of an aqueous solution of a reducing agent and an aqueous alkali solution circulated within a wet reactor comprising a reduction reaction region and an oxidation reaction region. The method and apparatus enable to prevent deterioration of the mixed aqueous solution, and can be continuously operated for a long time. Specifically, the ORP and pH of the mixed aqueous solution of the aqueous solution of a reducing agent and the aqueous alkali solution to be circulated within the wet reactor are measured, and a fresh aqueous solution of a reducing agent and a fresh aqueous alkali solution are supplied, if necessary, into a reservoir unit arranged in the lower part of the wet reactor so that the ORP and pH of the mixed aqueous solution are kept within predetermined ranges.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • OSAKA PREFECTURE UNIVERSITY PUBLIC CORPORATION
  • JAPAN SCINECE AND TECHNOLOGY AGENCY
  • TAKAO IRON WORKS, LTD.
  • 発明者(英語)
  • KUROKI, Tomoyuki
  • OKUBO, Masaaki
  • YAMAMOTO, Toshiaki
  • FUJISHIMA, Hidekatsu
  • OTSUKA, Keiichi
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO,AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH,BR(UTILITY MODEL),BW(UTILITY MODEL),BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM(UTILITY MODEL),DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH,GM,GT,HN,HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME(PETTY PATENT),MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM,PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,SV(UTILITY MODEL),SY,TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN,ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MT,NL,NO,PL,PT,RO,SE,SI,SK,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW,GH,GM,KE,LS,MW,MZ,NA,SD,SL,SZ,TZ,UG,ZM,ZW),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)

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