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DYE-SENSITIZED SOLAR CELL AND PROCESS FOR MANUFACTURING THE SAME 実績あり

外国特許コード F110002514
整理番号 S2006-1028-C0
掲載日 2011年3月14日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2007JP000667
国際公開番号 WO 2008/001488
国際出願日 平成19年6月21日(2007.6.21)
国際公開日 平成20年1月3日(2008.1.3)
優先権データ
  • 特願2006-178852 (2006.6.29) JP
発明の名称 (英語) DYE-SENSITIZED SOLAR CELL AND PROCESS FOR MANUFACTURING THE SAME 実績あり
発明の概要(英語) Disclosed is a dye-sensitized solar cell which can be manufactured by a relatively simple process and is capable of achieving a high conversion efficiency even when a porous semiconductor layer is formed thick. Also disclosed is a process for manufacturing such a dye-sensitized solar cell. Specifically disclosed is a dye-sensitized solar cell (10) comprising a conductive metal film (20), which is made of tungsten or the like and has many irregularly arranged through holes (24), within or on the conductive substrate side surface of a porous semiconductor layer (16). The through holes (24) of the conductive metal film (20) are formed as follows: a fine particle layer is formed on the surface of the porous semiconductor layer, then a conductive metal film is formed on the surface of the fine particle layer, and after that the fine particle layer is eliminated by heating or solvent cleaning.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • National University Corporation Kyushu Institute of Technology
  • Nippon Steel Chemical Co., Ltd.
  • 発明者(英語)
  • HAYASE, Shuzi
  • SHIRATSUCHI, Ryuichi
  • OHKUBO, Suehiro
  • YAMAGUCHI, Yoshihiro
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH,BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO,DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH,GM,GT,HN,HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM,PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,SV,SY,TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN,ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HU,IE,IS,IT,LT,LU,LV,MC,MT,NL,PL,PT,RO,SE,SI,SK,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW,GH,GM,KE,LS,MW,MZ,NA,SD,SL,SZ,TZ,UG,ZM,ZW),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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