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PROCESS FOR PRODUCING VESICLE, VESICLE OBTAINED BY THE PROCESS, AND PROCESS FOR PRODUCING FROZEN PARTICLE FOR USE IN VESICLE PRODUCTION 新技術説明会

外国特許コード F110002593
整理番号 S2008-0905-N0
掲載日 2011年3月28日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2008JP053740
国際公開番号 WO 2008/108324
国際出願日 平成20年3月3日(2008.3.3)
国際公開日 平成20年9月12日(2008.9.12)
優先権データ
  • 特願2007-053089 (2007.3.2) JP
発明の名称 (英語) PROCESS FOR PRODUCING VESICLE, VESICLE OBTAINED BY THE PROCESS, AND PROCESS FOR PRODUCING FROZEN PARTICLE FOR USE IN VESICLE PRODUCTION 新技術説明会
発明の概要(英語) [PROBLEMS] To provide a process for producing vesicles in which a desired substance can be encapsulated in a high proportion while regulating properties such as particle diameter to desired values. [MEANS FOR SOLVING PROBLEMS] A W/O emulsion is prepared from an aqueous solution in which a substance to be encapsulated is contained in a dissolved or suspended state and from an oil phase containing an emulsifying agent. Subsequently, the W/O emulsion is cooled to a temperature at which the aqueous solution therein becomes frozen particles and the oil phase retains its liquid state, and the oil phase is removed. Thereafter, an oil phase containing a vesicle-constituting lipid is added to the frozen particles, and the mixture is stirred to thereby replace the emulsifying agent present on the surface of the frozen particles with the vesicle-constituting lipid. An outer aqueous phase is added to the resultant frozen particles whose surface has been covered with a lipid film to hydrate the lipid film with the outer aqueous phase.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • University of Tsukuba
  • 発明者(英語)
  • ICHIKAWA, Sosaku
  • KUROIWA, Takashi
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO,AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH,BR(UTILITY MODEL),BW(UTILITY MODEL),BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM(UTILITY MODEL),DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH,GM,GT,HN,HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME(PETTY PATENT),MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM,PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,SV(UTILITY MODEL),SY,TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN,ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MT,NL,NO,PL,PT,RO,SE,SI,SK,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW,GH,GM,KE,LS,MW,MZ,NA,SD,SL,SZ,TZ,UG,ZM,ZW),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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