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ANTIBACTERIAL MEDICAL EQUIPMENT AND METHOD FOR PRODUCING THE SAME 新技術説明会

外国特許コード F110002637
整理番号 S2009-0712-N0
掲載日 2011年4月5日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2010JP058867
国際公開番号 WO 2010/134638
国際出願日 平成22年5月19日(2010.5.19)
国際公開日 平成22年11月25日(2010.11.25)
優先権データ
  • 特願2009-122472 (2009.5.20) JP
  • 61/272,498 (2009.9.30) US
発明の名称 (英語) ANTIBACTERIAL MEDICAL EQUIPMENT AND METHOD FOR PRODUCING THE SAME 新技術説明会
発明の概要(英語) An object of the present invention is to provide an antibacterial medical equipment which has sufficient antibacterial activity in vivo and is excellent in compatibility with living tissues, and also can maintain antibacterial activity over a long period and has high safety. An antibacterial medical equipment characterized in that inositol phosphate is bonded to a Ca compound of a medical equipment whose surface is at least coated with a layer of the Ca compound, or a medical equipment comprising the Ca compound. The antibacterial medical equipment as described above, wherein silver ions are bonded to the inositol phosphate. A method for producing an antibacterial medical equipment, which comprises bringing a medical equipment whose surface is at least coated with a layer of a Ca compound, or a medical equipment comprising a Ca compound into contact with an aqueous solution of inositol phosphate to obtain an antibacterial medical equipment in which inositol phosphate is bonded to the Ca compound. The method for producing an antibacterial medical equipment, wherein inositol phosphate is bonded to the Ca compound and then the Ca compound is brought into contact with an aqueous solution containing silver ions to obtain an antibacterial medical equipment in which silver ions are bonded to the inositol phosphate.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • MEIJI UNIVERSITY
  • KEIO UNIVERSITY
  • 発明者(英語)
  • AIZAWA Mamoru
  • HOSHIKAWA Tomoyuki
  • ISHII Ken
  • FUNAO Haruki
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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