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OPTICAL IMPRINT METHOD, MOLD DUPLICATING METHOD, AND MOLD DUPLICATE

外国特許コード F110002660
整理番号 S2008-0394-C0
掲載日 2011年4月6日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2009JP052402
国際公開番号 WO 2009/113357
国際出願日 平成21年2月13日(2009.2.13)
国際公開日 平成21年9月17日(2009.9.17)
優先権データ
  • 特願2008-065777 (2008.3.14) JP
発明の名称 (英語) OPTICAL IMPRINT METHOD, MOLD DUPLICATING METHOD, AND MOLD DUPLICATE
発明の概要(英語) Provided is an optical imprint method and so on, which keeps an expensive mold out of dirt and which has high productivity. This optical imprint method comprises applying a rework type optical crosslinking/curing resin to a substrate (1) thereby to form a resin layer (2), pushing a mold (3) to the resin layer (2), then emitting a first wavelength light, and peeling the mold (3) from the resin layer (2) so that a pattern is transferred to the resin layer (2). The rework type crosslinking/curing resin is crosslinked/cured by irradiating the resin with the first wavelength light, and is solubilized in a solvent by irradiating or heating the same with a second wavelength light having a shorter wavelength than the first wavelength. Even if a groove in the mold (3) is closed with the crosslinked/cured resin, therefore, the crosslinked/cured resin can be again solubilized by irradiating the mold (3) with the second wavelength light, so that the resin can be easily removed.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • Osaka Prefecture University Public Corporation
  • 発明者(英語)
  • SHIRAI, Masamitsu
  • HIRAI, Yoshihiko
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW(UTILITY MODEL),BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM(UTILITY MODEL),DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN,HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)

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