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SOLUTION CONCENTRATION DISTRIBUTION MEASURING DEVICE 新技術説明会

外国特許コード F110002664
整理番号 S2008-0024-C0
掲載日 2011年4月6日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2008JP068478
国際公開番号 WO 2009/051080
国際出願日 平成20年10月10日(2008.10.10)
国際公開日 平成21年4月23日(2009.4.23)
優先権データ
  • 特願2007-268413 (2007.10.15) JP
発明の名称 (英語) SOLUTION CONCENTRATION DISTRIBUTION MEASURING DEVICE 新技術説明会
発明の概要(英語) [PROBLEMS] To provide a device for detecting a reaction distribution or a concentration distribution of a material present within a microflow passage for a solution chemical reaction. [MEANS FOR SOLVING PROBLEMS] A material distribution measuring device (1) for measuring a reaction distribution or a concentration distribution of a material contained in a solution. The material distribution measuring device (1) comprises a material detecting plate (5) comprising a material-sensitive film (21) provided on an insulator (22) provided on a semiconductor (23), a flow passage forming part (6) forming a solution flow passage (12) on the material detecting plate (5), means for stabilizing the potential of the solution, means for applying a pulsed laser beam (9) from the semiconductor (23) side to the flow passage (12) side, means for scanning the material detecting plate (5) two-dimensionally with use of the pulsed laser beam (9), means for measuring the amplitude strength of pulsed electromagnetic waves generated upon the application of the pulsed laser beam (9) to the material detecting plate (5), and means for obtaining a reaction distribution or a concentration distribution of the material contained in the solution within the flow passage by qualitatively or quantitatively measuring the material to be detected from the amplitude strength. The material-sensitive film (21) constitutes a part of the inner wall surface of the flow passage (12).
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • National University Corporation Okayama University
  • 発明者(英語)
  • KIWA, Toshihiko
  • TSUKADA, Keiji
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW(UTILITY MODEL),BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM(UTILITY MODEL),DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN,HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME(PETTY PATENT),MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MT,NL,NO,PL,PT,RO,SE,SI,SK,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)

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