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L-CYSTEINE-PRODUCING BACTERIUM, AND METHOD FOR PRODUCTION OF L-CYSTEINE

外国特許コード F110002759
整理番号 S2008-0346-C0
掲載日 2011年4月13日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2009JP053021
国際公開番号 WO 2009/104731
国際出願日 平成21年2月20日(2009.2.20)
国際公開日 平成21年8月27日(2009.8.27)
優先権データ
  • 特願2008-040167 (2008.2.21) JP
発明の名称 (英語) L-CYSTEINE-PRODUCING BACTERIUM, AND METHOD FOR PRODUCTION OF L-CYSTEINE
発明の概要(英語) L-Cysteine, L-cystine, a derivative or precursor thereof, or a mixture of two or more of L-cysteine, L-cystine and a derivative or precursor thereof can be produced by: culturing a bacterium belonging to the family Enterobacteriaceae which is capable of producing L-cysteine and is so modified that the activity of a protein encoded by tolC gene (e.g., any one of proteins (A) and (B) shown below) can be increased in a culture medium; and collecting L-cysteine, L-cystine, the derivative or precursor thereof or the mixture from the culture: (A) a protein comprising then amino acid sequence depicted in SEQ ID NO:2; and (B) a protein which comprises an amino acid sequence having the substitution, deletion, insertion or addition of one or several amino acid residues in the amino acid sequence depicted in SEQ ID NO:2 and which is increased in its L-cysteine production ability when the activity in the bacterium is increased.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • AJINOMOTO CO., INC.
  • NATIONAL UNIVERSITY CORPORATION NARA INSTITUTE OF SCIENCE AND TECHNOLOGY
  • 発明者(英語)
  • NONAKA, Gen
  • TAKAGI, Hiroshi
  • OHTSU, Iwao
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW(UTILITY MODEL),BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM(UTILITY MODEL),DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN,HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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