TOP > 外国特許検索 > ANODES FOR ELECTROLYTIC WINNING OF ZINC AND COBALT AND METHOD FOR ELECTROLYTIC WINNING

ANODES FOR ELECTROLYTIC WINNING OF ZINC AND COBALT AND METHOD FOR ELECTROLYTIC WINNING 実績あり

外国特許コード F110002808
整理番号 S2010-0205-N0
掲載日 2011年4月27日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2009JP060504
国際公開番号 WO 2009/151044
国際出願日 平成21年6月9日(2009.6.9)
国際公開日 平成21年12月17日(2009.12.17)
優先権データ
  • 特願2008-151007 (2008.6.9) JP
  • 特願2008-163714 (2008.6.23) JP
発明の名称 (英語) ANODES FOR ELECTROLYTIC WINNING OF ZINC AND COBALT AND METHOD FOR ELECTROLYTIC WINNING 実績あり
発明の概要(英語) Disclosed is an anode for electrolytic winning of zinc that can suppress the precipitation of a manganese compound on the anode. Also disclosed is an anode for electrolytic winning of cobalt that can suppress the precipitation of cobalt oxyhydroxide on the anode. The anode for electrolytic winning of zinc comprises an electroconductive base and a catalyst layer containing amorphous iridium oxide provided on the electroconductive base. Also disclosed is a method for electrolytic winning of zinc using the anode for electrolytic winning of zinc. The anode for electrolytic winning of cobalt comprises an electroconductive base and a catalyst layer containing amorphous iridium oxide or amorphous ruthenium oxide provided on the electroconductive base. Also disclosed is a method for electrolytic winning of cobalt using the anode for electrolytic winning of cobalt.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • THE DOSHISHA
  • 発明者(英語)
  • MORIMITSU, Masatsugu
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW(UTILITY MODEL),BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN,HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)

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