TOP > 外国特許検索 > METHOD FOR SELECTING SECONDARY NEUROSPHERE DERIVED FROM DIFFERENTIATED CELL-DERIVED PLURIPOTENT STEM CELL, CLONE SELECTED BY THE METHOD AND USE OF THE CLONE

METHOD FOR SELECTING SECONDARY NEUROSPHERE DERIVED FROM DIFFERENTIATED CELL-DERIVED PLURIPOTENT STEM CELL, CLONE SELECTED BY THE METHOD AND USE OF THE CLONE

外国特許コード F110002815
整理番号 S2008-0888-C0
掲載日 2011年5月2日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2009JP003755
国際公開番号 WO 2010/016253
国際出願日 平成21年8月5日(2009.8.5)
国際公開日 平成22年2月11日(2010.2.11)
優先権データ
  • 61/086,369 (2008.8.5) US
発明の名称 (英語) METHOD FOR SELECTING SECONDARY NEUROSPHERE DERIVED FROM DIFFERENTIATED CELL-DERIVED PLURIPOTENT STEM CELL, CLONE SELECTED BY THE METHOD AND USE OF THE CLONE
発明の概要(英語) In order to provide a therapeutic agent for nerve injury which contains iPS-derived neural stem cells and has low or no risk of side effects, as well as a method for treating a nerve injury using the iPS cells, by efficiently establishing in vivo the iPS-derived neural stem having low or no risk of tumor formation, neurospheres are formed following formation of embryoid bodies from the iPS cells, and a clone whose ratio of cells in which the promoter of Nanog gene is activated is 0.01% or less is selected, and the clone is administered to a patient suffering from the nerve injury.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • KEIO UNIVERSITY
  • KYOTO UNIVERSITY
  • 発明者(英語)
  • OKANO, Hideyuki
  • TSUJI, Osahiko
  • NAKAMURA, Masaya
  • YAMANAKA, Shinya
  • MIURA, Kyoko
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW(UTILITY MODEL),BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN,HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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