TOP > 外国特許検索 > METHOD OF MANUFACTURING PRECURSOR FOR FOAM METAL AND METHOD OF MANUFACTURING FOAM METAL, AND PRECURSOR FOR FOAM METAL AND FOAM METAL MANUFACTURED BY THE METHODS

METHOD OF MANUFACTURING PRECURSOR FOR FOAM METAL AND METHOD OF MANUFACTURING FOAM METAL, AND PRECURSOR FOR FOAM METAL AND FOAM METAL MANUFACTURED BY THE METHODS 新技術説明会

外国特許コード F110002888
整理番号 S2008-0674-C0
掲載日 2011年5月9日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2009JP065097
国際公開番号 WO 2010/029864
国際出願日 平成21年8月28日(2009.8.28)
国際公開日 平成22年3月18日(2010.3.18)
優先権データ
  • 特願2008-235131 (2008.9.12) JP
発明の名称 (英語) METHOD OF MANUFACTURING PRECURSOR FOR FOAM METAL AND METHOD OF MANUFACTURING FOAM METAL, AND PRECURSOR FOR FOAM METAL AND FOAM METAL MANUFACTURED BY THE METHODS 新技術説明会
発明の概要(英語) Provided are a method of manufacturing a precursor for foam metal, a method of manufacturing a foam metal, a precursor for foam metal obtained by the manufacturing method, and a foam metal obtained by the manufacturing method. The method of manufacturing a precursor for foam metal includes a step of superimposing base materials (1 and 2) one on another with a foaming agent (3) interposed therebetween and a step of performing a friction stir processing on one surface of the superimposed base materials (1 and 2) to thereby weld the base materials (1 and 2) together and simultaneously therewith, dispersing the foaming agent (3) in the base materials (1 and 2). In the method of manufacturing a foam metal, the precursor obtained by the above manufacturing method is foamed by overheating.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • NATIONAL UNIVERSITY CORPORATION GUNMA UNIVERSITY
  • SHIBAURA INSTITUTE OF TECHNOLOGY
  • 発明者(英語)
  • HANGAI, Yoshihiko
  • UTSUNOMIYA, Takao
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW(UTILITY MODEL),BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN,HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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