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POLYHYDROXYALKANOATE COPOLYMER AND MANUFACTURING METHOD THEREFOR

外国特許コード F110002966
整理番号 S2008-0605-C0
掲載日 2011年5月9日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2009JP058429
国際公開番号 WO 2009/147918
国際出願日 平成21年4月22日(2009.4.22)
国際公開日 平成21年12月10日(2009.12.10)
優先権データ
  • 特願2008-148076 (2008.6.5) JP
発明の名称 (英語) POLYHYDROXYALKANOATE COPOLYMER AND MANUFACTURING METHOD THEREFOR
発明の概要(英語) Disclosed are a PHA copolymer that contains an (R) [NON-BREAKING HYPHEN] 3 [NON-BREAKING HYPHEN] hydroxy [NON-BREAKING HYPHEN] 4 [NON-BREAKING HYPHEN] methylvaleric acid unit, and a manufacturing method therefor. Disclosed is a polyhydroxyalkanoate copolymer that contains at least an (R) [NON-BREAKING HYPHEN] 3 [NON-BREAKING HYPHEN] hydroxy [NON-BREAKING HYPHEN] 4 [NON-BREAKING HYPHEN] methylvaleric acid unit, and a polyhydroxyalkanoate copolymer manufacturing method with which a transformant, obtained by introducing a polyhydroxyalkanoate polymerase gene into a microbe selected from Escherichia coli, Ralstonia, and Pseudomonas bacteria, is cultured in the presence of a carbon source and an (R) [NON-BREAKING HYPHEN] 3 [NON-BREAKING HYPHEN] hydroxy [NON-BREAKING HYPHEN] 4 [NON-BREAKING HYPHEN] methylvaleric acid precursor, and then a polyhydroxyalkanoate copolymer that contains at least an (R) [NON-BREAKING HYPHEN] 3 [NON-BREAKING HYPHEN] hydroxy [NON-BREAKING HYPHEN] 4 [NON-BREAKING HYPHEN] methylvaleric acid unit is harvested from the resulting culture.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • Tokyo Institute of Technology
  • 発明者(英語)
  • TSUGE, Takeharu
  • YAMAMOTO, Tetsuya
  • KITAGAWA, Asahi
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW(UTILITY MODEL),BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN,HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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