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METHOD OF FORMING FINE CRYSTAL GRAINS IN NITROGEN-DOPED Co-Cr-Mo ALLOY AND NITROGEN-DOPED Co-Cr-Mo ALLOY 新技術説明会

外国特許コード F110002982
整理番号 S2008-0597-C0
掲載日 2011年5月10日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2009JP065358
国際公開番号 WO 2010/026996
国際出願日 平成21年9月2日(2009.9.2)
国際公開日 平成22年3月11日(2010.3.11)
優先権データ
  • 特願2008-227875 (2008.9.5) JP
発明の名称 (英語) METHOD OF FORMING FINE CRYSTAL GRAINS IN NITROGEN-DOPED Co-Cr-Mo ALLOY AND NITROGEN-DOPED Co-Cr-Mo ALLOY 新技術説明会
発明の概要(英語) An even and fine crystal grain structure is obtained in producing a nitrogen-doped Co-Cr-Mo alloy comprising 26-35 wt.% chromium, 2-8 wt.% molybdenum, 0.1-0.3 wt.% nitrogen, and cobalt as the remainder, through heat treatments only without conducting any processing such as hot forging based on recrystallization. The alloy is subjected to solution heat treatment and then to isothermal aging in which the alloy is held at 670-830oC for a certain period to form a mixed-phase structure comprising an .epsilon. phase and chromium nitride. This alloy is cooled and then subjected to a reverse transformation treatment in which the alloy is reheated to a temperature in the range of 870-1,100oC, whereby the mixed-phase structure comprising an .epsilon. phase and chromium nitride is reversely transformed into a single-phase structure constituted of a .gamma. phase.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • Tohoku University
  • 発明者(英語)
  • KUROSU Shingo
  • CHIBA Akihiko
  • MATSUMOTO Hiroaki
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW(UTILITY MODEL),BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN,HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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