TOP > 外国特許検索 > VOICE SYNTHESIS APPARATUS BASED ON SINGLE-MODEL VOICE RECOGNITION SYNTHESIS, VOICE SYNTHESIS METHOD AND VOICE SYNTHESIS PROGRAM

VOICE SYNTHESIS APPARATUS BASED ON SINGLE-MODEL VOICE RECOGNITION SYNTHESIS, VOICE SYNTHESIS METHOD AND VOICE SYNTHESIS PROGRAM

外国特許コード F110003006
整理番号 S2009-0467-C0
掲載日 2011年5月10日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2010JP053802
国際公開番号 WO 2010/104040
国際出願日 平成22年3月8日(2010.3.8)
国際公開日 平成22年9月16日(2010.9.16)
優先権データ
  • 特願2009-055784 (2009.3.9) JP
発明の名称 (英語) VOICE SYNTHESIS APPARATUS BASED ON SINGLE-MODEL VOICE RECOGNITION SYNTHESIS, VOICE SYNTHESIS METHOD AND VOICE SYNTHESIS PROGRAM
発明の概要(英語) Disclosed are a voice synthesis apparatus, voice synthesis method and voice synthesis program capable of implementing voice synthesis of a specified individual with high quality using few items of learned voice data. The voice synthesis apparatus learns a transition model (225) of articulatory movement stored for each of fixed voice units such as phonemes, from an unspecified large number of speakers. The voice synthesis apparatus is provided with means (230) for converting to voice synthesis parameters that carry vocal tract shape information whereby a series of articulatory features is adapted to individuals and an optimum voice unit series is obtained at the same time by comparing this model with the input voice. In addition, the voice synthesis apparatus obtains high-quality synthesised voice for a specified individual by registering sound source code in a state transition model of articulatory movement using closed loop learning employing a drive sound source codebook.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • National University Corporation TOYOHASHI UNIVERSITY OF TECHNOLOGY
  • 発明者(英語)
  • NITTA Tsuneo
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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