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HOLLOW MICROTUBE STRUCTURES, PRODUCTION METHOD THEREOF, AND LIVING ORGANISM INSPECTION DEVICE

外国特許コード F110003007
整理番号 S2009-0562-C0
掲載日 2011年5月10日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2010JP054893
国際公開番号 WO 2010/107122
国際出願日 平成22年3月19日(2010.3.19)
国際公開日 平成22年9月23日(2010.9.23)
優先権データ
  • 特願2009-069216 (2009.3.20) JP
発明の名称 (英語) HOLLOW MICROTUBE STRUCTURES, PRODUCTION METHOD THEREOF, AND LIVING ORGANISM INSPECTION DEVICE
発明の概要(英語) Disclosed is a hollow microtube structure which can be used as a minimally invasive electrode, and a production method thereof. Further disclosed is a living organism inspection device which uses the abovementioned hollow microtube structure. The hollow microtube structure is provided with a semiconductor substrate (2) and a hollow microtube (4) formed on the surface of said semiconductor substrate. The hollow microtube is provided with a metal coating film layer (6) on the inner surface, and an insulating coating film layer (7) on the outer circumference. The semiconductor substrate has a through hole which connects to the inside of the hollow tube at the location of hollow tube formation. The production method comprises an etching step, a quasi-layer formation step, a metal coating film layer formation step, an insulating coating film layer formation step, a tip removal step, and a piercing step. The living organism inspection device is structured so as to be provided on the substrate side of the hollow microtube structure with at least one of an electric signal transmitter, an optical signal transmitter, a chemical injector, an electrical measuring instrument, a chemical measuring instrument, and an optical measuring instrument.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • National University Corporation TOYOHASHI UNIVERSITY OF TECHNOLOGY
  • 発明者(英語)
  • ISHIDA Makoto
  • KAWANO Takeshi
  • KAWASHIMA Takahiro
  • TAKEI Kuniharu
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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