TOP > 外国特許検索 > CARBON NANORING, METHOD FOR PRODUCING SAME, COMPOUND SUITABLE AS STARTING MATERIAL FOR PRODUCING THE CARBON NANORING, AND METHOD FOR PRODUCING THE COMPOUND

CARBON NANORING, METHOD FOR PRODUCING SAME, COMPOUND SUITABLE AS STARTING MATERIAL FOR PRODUCING THE CARBON NANORING, AND METHOD FOR PRODUCING THE COMPOUND コモンズ

外国特許コード F110003075
整理番号 NU-0415
掲載日 2011年5月27日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2011JP052948
国際公開番号 WO 2011/099588
国際出願日 平成23年2月10日(2011.2.10)
国際公開日 平成23年8月18日(2011.8.18)
優先権データ
  • 特願2010-196174 (2010.9.1) JP
  • 特願2010-029490 (2010.2.12) JP
発明の名称 (英語) CARBON NANORING, METHOD FOR PRODUCING SAME, COMPOUND SUITABLE AS STARTING MATERIAL FOR PRODUCING THE CARBON NANORING, AND METHOD FOR PRODUCING THE COMPOUND コモンズ
発明の概要(英語) Disclosed are: a compound which is capable of accurately forming a carbon nanoring that is composed of a specific number of organic rings and has a definite diameter; a method for producing the compound; a method for efficiently producing a carbon nanoring; and a cycloparaphenylene obtained by the production method. Specifically disclosed is a carbon nanoring which is a compound obtained by bonding a specific number of organic ring groups. Also specifically disclosed is a method for producing a carbon nanoring, which comprises a modification step wherein a halogen atom in a U-shaped compound is modified into a boron compound, and a coupling step wherein the U-shaped compound is subjected to a coupling reaction. In this connection, the U-shaped compound is a novel compound that has a cyclohexane ring, a benzene ring and a specific organic ring group.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY
  • 発明者(英語)
  • ITAMI, Kenichiro
  • SEGAWA, Yasutomo
  • OMACHI, Haruka
  • MATSUURA, Sanae
  • MATSUI, Katsuma
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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