TOP > 外国特許検索 > GENERATION METHOD FOR COMPLEX AMPLITUDE IN-LINE HOLOGRAM AND IMAGE RECORDING DEVICE USING SAID METHOD

GENERATION METHOD FOR COMPLEX AMPLITUDE IN-LINE HOLOGRAM AND IMAGE RECORDING DEVICE USING SAID METHOD コモンズ 新技術説明会

外国特許コード F110003076
整理番号 Kt09-11
掲載日 2011年6月2日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2010JP073185
国際公開番号 WO 2011/089820
国際出願日 平成22年12月22日(2010.12.22)
国際公開日 平成23年7月28日(2011.7.28)
優先権データ
  • 特願2010-012425 (2010.1.22) JP
発明の名称 (英語) GENERATION METHOD FOR COMPLEX AMPLITUDE IN-LINE HOLOGRAM AND IMAGE RECORDING DEVICE USING SAID METHOD コモンズ 新技術説明会
発明の概要(英語) Disclosed are a generation method for a complex amplitude in-line hologram and an image recording device using said method, wherein it is possible to realize high-speed processing and high-speed recording from a single off-axis hologram without limiting the spatial frequency band and without creating errors from interpolation, and the like. The complex amplitude in-line hologram (J) is generated by performing the following in order: the acquisition of data for one off-axis hologram (I) obtained by means of off-axis holography, and for an off-axis reference light (R) used for obtaining the hologram (I) (S1); the setting of a reproduction in-line reference light (R') (S2); a modulation process for performing spatial heterodyne modulation on the hologram (I) on the basis of the phases of the reference lights (R, R') (S3); and a filtering process for performing spatial frequency filtering on the hologram modulated by the modulation process (S4). For parts upon which spatial sampling is not performed, the limits on the field of view (.psi.) are relaxed.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • Hyogo Prefectural Government
  • 発明者(英語)
  • SATO Kunihiro
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)

PAGE TOP

close
close
close
close
close
close