TOP > 外国特許検索 > POLYHEDRAL METAL COMPLEX, TRANSITION METAL COMPLEX CONTAINING ULTRAFINE PARTICLES THEREIN, AND PROCESS FOR PRODUCING SAME

POLYHEDRAL METAL COMPLEX, TRANSITION METAL COMPLEX CONTAINING ULTRAFINE PARTICLES THEREIN, AND PROCESS FOR PRODUCING SAME

外国特許コード F110003186
整理番号 AF11-02WO
掲載日 2011年6月22日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2010JP054008
国際公開番号 WO 2010/104113
国際出願日 平成22年3月10日(2010.3.10)
国際公開日 平成22年9月16日(2010.9.16)
優先権データ
  • 特願2009-058194 (2009.3.11) JP
発明の名称 (英語) POLYHEDRAL METAL COMPLEX, TRANSITION METAL COMPLEX CONTAINING ULTRAFINE PARTICLES THEREIN, AND PROCESS FOR PRODUCING SAME
発明の概要(英語) Provided is a polyhedral transition metal complex having hollow shells, the hollow shells each comprising n1 transition metal atoms (n1 is an integer of 6-60) and 2(n1) bidentate organic ligands, the bidentate organic ligands having groups of a polyhydroxy compound through linking groups, each hollow shell having been formed so that the groups of a polyhydroxy compound are oriented inward in the hollow shell. Also provided are: a polyhedral transition metal complex containing ultrafine particles therein which is characterized by comprising the polyhedral transition metal complex and ultrafine metal oxide particles held in the hollow shells of the complex; and a process for producing the complex. With the polyhedral transition metal complex, fine metal oxide particles having an even size with a diameter of several nanometers can be efficiently obtained. The polyhedral transition metal complex containing ultrafine particles therein comprises the complex and ultrafine metal oxide particles enclosed in the hollow shells thereof.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • Japan Science and Technology Agency
  • 発明者(英語)
  • FUJITA Makoto
  • SATO Sota
  • SUZUKI Kosuke
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
参考情報 (研究プロジェクト等) CREST Development of the Foundation for Nano-Interface Technology AREA
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