TOP > 外国特許検索 > Method for preparing a substrate with micrometallic masses aligned on the surface

Method for preparing a substrate with micrometallic masses aligned on the surface

外国特許コード F110004070
整理番号 N021-10WO
掲載日 2011年7月8日
出願国 欧州特許庁(EPO)
出願番号 07741001
公報番号 2003091
公報番号 2003091
出願日 平成19年4月4日(2007.4.4)
公報発行日 平成20年12月17日(2008.12.17)
公報発行日 平成27年9月16日(2015.9.16)
国際出願番号 JP2007057565
国際公開番号 WO2007122998
国際出願日 平成19年4月4日(2007.4.4)
国際公開日 平成19年11月1日(2007.11.1)
優先権データ
  • 2007JP057565 (2007.4.4) WO
  • 特願2006-115562 (2006.4.19) JP
発明の名称 (英語) Method for preparing a substrate with micrometallic masses aligned on the surface
発明の概要(英語) The objective is to present a metal nanostructure having metal masses with zero valence aligned on a substrate surface wherein the size and shape of the metal masses are controlled and a manufacturing process thereof.
A micro phase separation membrane comprising an amphiphilic block copolymer assumes a state that contains numerous micro diameter hydrophilic cylinders inside the membrane in the direction perpendicular to the membrane surface.
The membrane is prepared using a solution containing an amphiphilic block copolymer and desired metal ions or by bringing a micro phase separation membrane of an amphiphilic block copolymer in contact with a solution containing metal ions after the membrane is formed to localize the metal ions in the hydrophilic micro diameter cylinders.
A substrate containing numerous zero valence metal masses in approximately pillar shapes, approximately dot shapes or combinations of these at set intervals can be obtained by conducting a reduction treatment and a treatment to remove organic materials on the micro phase separation membrane.
As the treatment, ultraviolet light irradiation or electron beam irradiation, plasma treatments, chemical reduction processes or electrochemical reduction processes may be used.
特許請求の範囲(英語) [claim1]
1. A method for preparing a substrate with micrometallic masses aligned on its surface, wherein the substrate contains numerous zero valence fine metal masses aligned on the surface at intervals of 10 nm to 50 nm wherein the fine metal masses are pillar-shaped or dot-shaped or a combination thereof and have diameters of 3 nm to 15 nm wherein the pillar-shaped masses are oriented in a direction substantially perpendicular to the surface, wherein the method comprises the steps of (a) preparing a micro phase separation membrane of an amphiphilic block copolymer on a substrate wherein the membrane has a thickness of 50 nm to 1 micron m and then exposing the membrane to a solution containing metal ions, (b) drying the membrane to form a micro phase separation membrane with the metal ions localized in its hydrophilic segment, and (c) irradiating vacuum ultraviolet light on the micro phase separation membrane under vacuum to reduce the metal ions and, as a result of the irradiation, organic materials including those in the micro phase separation membrane are removed, leaving the fine metal masses on the surface.
[claim2]
2. The method of claim 1 wherein the metal is a copper group metal or a platinum group transition metal.
[claim3]
3. The method of claim 1 or 2 wherein the amphiphilic block copolymer is represented by the general formula (1) below:

General formula (1): CH 3(OCH 2CH 2) mOCOC(CH 3) 2(CH 2C(CH 3)COOR)) n-X

wherein m and n, may be identical or different from each other, are integers 5 to 500 independently, R is a substituent represented by the general formula (2) or (3) shown below, X represents a hydrogen atom or halogen atom;

General formula (2): -CH 2(CH 2) aCH 2O-B-N=N-B-R **1

wherein a is an integer 0 to 20, R **1 is a hydrogen atom or an alkyl group containing 1 to 22 carbon atoms and B represents a p-phenylene group;

General formula (3): -CH 2(CH 2) bCH 2O-B-CH=CH-B-R **2

wherein b is an integer 0 to 20, R **2 is a hydrogen atom or an alkyl group containing 1 to 22 carbon atoms and B represents a p-phenylene group.
  • 出願人(英語)
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY
  • 発明者(英語)
  • WATANABE SHIGERU
  • LI JINGZE
国際特許分類(IPC)
欧州特許分類/主・副
  • B81C001/00C2A
  • B82Y020/00
  • B82Y030/00
  • L81C201/01B12A
指定国 Contracting States: DE
参考情報 (研究プロジェクト等) CREST Nano Factory and Process Monitoring for Advanced Information Processing and Communication AREA
ライセンスをご希望の方、特許の内容に興味を持たれた方は、問合せボタンを押してください。

PAGE TOP

close
close
close
close
close
close