TOP > 外国特許検索 > Method of patterning self-organizing material, patterned substrate of self-organizing material and method of producing the same, and phosomask using patterned substrate of self-organizing material

Method of patterning self-organizing material, patterned substrate of self-organizing material and method of producing the same, and phosomask using patterned substrate of self-organizing material

外国特許コード F110004078
整理番号 N051-08WO
掲載日 2011年7月8日
出願国 欧州特許庁(EPO)
出願番号 05788374
公報番号 1808407
公報番号 1808407
出願日 平成17年9月29日(2005.9.29)
公報発行日 平成19年7月18日(2007.7.18)
公報発行日 平成26年12月31日(2014.12.31)
国際出願番号 JP2005017930
国際公開番号 WO2006035859
国際出願日 平成17年9月29日(2005.9.29)
国際公開日 平成18年4月6日(2006.4.6)
優先権データ
  • 2005JP017930 (2005.9.29) WO
  • 特願2004-287549 (2004.9.30) JP
発明の名称 (英語) Method of patterning self-organizing material, patterned substrate of self-organizing material and method of producing the same, and phosomask using patterned substrate of self-organizing material
発明の概要(英語) It is intended to provide a method of pattering a self-organizing material whereby a self-organizing material having a self-organizing ability such as a nucleic acid can be aligned and immobilized in a desired manner on a substrate by using the imprint process, a self-organizing material-patterned substrate, and a method of producing the same, and a photomask.
An immobilization layer containing a binding material capable of binding to a self-organizing material is formed on a substrate.
Then this immobilization layer is patterned by transferring a protrusion and recess pattern formed in a mold thereto by the imprint process.
The self-organizing material is supplied onto the side having the protrusion and recess pattern of the immobilization layer transferred thereto.
Thus, the self-organizing material is immobilized according to the protrusion and recess pattern of the immobilization layer owning to the self-organizing ability of the mat erial per se and the binding ability of the binding material contained in the immobilization layer.(see diagramm)
特許請求の範囲(英語) [claim1]
1. A method of patterning a self-organizing material, comprising: forming, on a substrate, a first immobilization layer containing a binding material having an ability of binding with the self-organizing material having a self-organizing ability; the binding material being aminosilane, the self-organizing material being a material selected from the group consisting of nucleic acids, proteins, cells and tissue sections, or a second immobilization layer containing a binding material having an ability of binding with the self-organizing material having a self-organizing ability; the binding material being poly-L-lysine, the self-organizing material being DNA; patterning the first or second immobilization layer by transferring a protrusion and recess pattern of a mold to the first or second immobilization layer by imprinting process; supplying the self-organizing material to that surface of the first or second immobilization layer on which the protrusion and recess patterned is transferred; and immobilizing the self-organizing material according to the protrusion and recess pattern of the first or second immobilization layer by utilizing the self-organizing ability of the self-organizing material and the binding ability of the binding material contained in the first or second immobilization layer.
[claim2]
2. A method of producing a self-organizing material-patterned substrate in which a self-organizing material having a self-organizing ability is patterned in a predetermined pattern on the substrate, the self-organizing material being (1) a material selected from the group consisting of nucleic acids, proteins, cells and tissue sections; or (2) DNA, the method comprising: the immobilization layer forming step including: forming, on a substrate, a first immobilization layer containing a binding material having an ability of binding with the self-organizing material of (1) having a self-organizing ability, the binding material being aminosilane, or a second immobilization layer containing a binding material having an ability of binding with the self-organizing material of (2) having a self-organizing ability, the binding material being poly-L-lysine; and patterning the first or second immobilization layer by transferring a protrusion and recess pattern of a mold to the first or second immobilization layer by imprinting process; and the self-organizing material immobilizing step including: supplying, to the first immobilization layer containing the aminosilane, the self-organizing material of (1) to that surface of the first immobilization layer on which the protrusion and recess patterned is transferred, or supplying, to the second immobilization layer containing the poly-L-lysine, the self-organizing material of (2) to that surface of the second immobilization layer on which the protrusion and recess patterned is transferred; andimmobilizing the self-organizing material according to the protrusion and recess pattern of the first or second immobilization layer by utilizing the self-organizing ability of the self-organizing material and the binding ability of the binding material contained in the first or second immobilization layer.
[claim3]
3. A self-organizing material-patterned substrate on which a self-organizing material having a self-organizing ability is patterned in a predetermined pattern, the self-organizing material being (1) a material selected from the group consisting of nucleic acids, proteins, cells and tissue sections; or (2) DNA, the self-organizing material-patterned substrate comprising: a substrate; and a first immobilization layer on the substrate containing a binding material having an ability of binding with the self organizing material of (1) and having a protrusion and recess patterned on its surface, the binding material being aminosilane, or a second immobilization layer on the substrate containing a binding material having an ability of binding with the self organizing material of (2) and having a protrusion and recess patterned on its surface the binding material being poly-L-lysine, and the first immobilization layer having a self-organizing material-patterned layer being formed by immobilizing the self-organizing material of (1) in a recess portion of the first immobilization layer, and the second immobilization layer having a self-organizing material-patterned layer being formed by immobilizing the self-organizing material of (2) in a recess portion of the second immobilization layer.
[claim4]
4. A photo mask comprising a self-organizing material-patterned substrate as set forth in claims 3.
[claim5]
5. The self-organizing material-patterned substrate as set forth in claim 3, wherein: the self-organizing material of (1) is a nucleic acid and the self-organizing material of (2) is DNA; and a metal is patterned by using the nucleic acid or DNA as template.
[claim6]
6. The self-organizing material-patterned substrate as set forth in claim 5, wherein the metal is a transition metal.
[claim7]
7. The self-organizing material-patterned substrate as set forth in claim 6, wherein the transition metal includes at least one of gold, silver, platinum, palladium, iridium, rhodium, osmium, and ruthenium.
[claim8]
8. The self-organizing material-patterned substrate as set forth in claim 3, wherein: the self-organizing material of (1) is a nucleic acid and the self-organizing material of (2) is DNA; and a pigment is inserted in the nucleic acid or DNA.
[claim9]
9. The self-organizing material-patterned substrate as set forth in claim 8, wherein the pigment is acridine orange.
  • 出願人(英語)
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY
  • 発明者(英語)
  • OHTAKE TOSHIHITO
  • NAKAMATSU KEN-ICHIRO
  • MATSUI SHINJI
  • TABATA HITOSHI
  • KAWAI TOMOJI
国際特許分類(IPC)
指定国 Contracting States: DE FR GB
参考情報 (研究プロジェクト等) CREST Creation of Novel Nano-material/System Synthesized by Self-organization for Medical Use AREA
ライセンスをご希望の方、特許の内容に興味を持たれた方は、問合せボタンを押してください。

PAGE TOP

close
close
close
close
close
close