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Shear measuring method and its device 新技術説明会 実績あり

外国特許コード F110004081
整理番号 N051-14WO
掲載日 2011年7月8日
出願国 欧州特許庁(EPO)
出願番号 06810594
公報番号 1942331
出願日 平成18年9月27日(2006.9.27)
公報発行日 平成20年7月9日(2008.7.9)
国際出願番号 JP2006319103
国際公開番号 WO2007037241
国際出願日 平成18年9月27日(2006.9.27)
国際公開日 平成19年4月5日(2007.4.5)
優先権データ
  • 2006JP319103 (2006.9.27) WO
  • 特願2005-282769 (2005.9.28) JP
  • 特願2005-282768 (2005.9.28) JP
発明の名称 (英語) Shear measuring method and its device 新技術説明会 実績あり
発明の概要(英語) A resonance shear measuring method capable of simple and rapid measurement by obtaining a resonance shear curve through Fourier transformation of a damping curve of an oscillation on one side surface of a sample during measurement of shear response from the sample is provided.
The method is to measure shear response of the sample sandwiched between the solid surfaces of a resonance shear measurement unit along with a change in film thickness by applying an input signal U in to a horizontal driving section of the shear resonance measurement unit, by detecting an oscillation on one side surface of the sample sandwiched between solid surfaces of the resonance shear measurement unit as an output signal U out by means of a displacement gauge, and by applying the output signal U out along with the input signal U in to a resonance shear signal analyzer, wherein a damping curve of the oscillation on one side surface of the sample is Fourier transformed by a Fourier transformation section (5B) to obtain a resonance shear curve.
Also provided is a twin-path type apparatus for shear stress measurement capable of precise measurement of shear stress by using a twin-path method by which a distance between opaque substrates can be measured.
特許請求の範囲(英語) [claim1]
1. A resonance shear measuring method to measure a shear response of a sample sandwiched between solid surfaces in a resonance shear measurement unit, along with a change in film thickness, the method comprising steps of: applying an input signal U in to a horizontal driving section of the resonance shear measurement unit, detecting an oscillation of a surface on one side of the sample sandwiched between the solid surfaces set in the resonance shear measurement unit by means of a displacement gauge, the output of detection being an output signal U out, and, applying the output signal U out along with the input signal U in to a resonance shear signal analyzer, wherein a resonance shear curve is obtained by performing a Fourier transformation of a damping curve of the oscillation of the surface on one side of the sample.
[claim2]
2. A resonance shear measuring method to measure a shear response of a sample which is solid surfaces themselves without any other sample sandwiched between the solid surfaces in a resonance shear measurement unit, along with a change in film thickness, the method comprising steps of: applying an input signal U in to a horizontal driving section of the resonance shear measurement unit, detecting an oscillation of a surface on one side of the sample in the resonance shear measurement unit by means of a displacement gauge, the output of detection being an output signal U out, and, applying the output signal U out along with the input signal U in to a resonance shear signal analyzer, wherein a resonance shear curve is obtained by performing a Fourier transformation of a damping curve of the oscillation of the surface on one side of the sample.
[claim3]
3. The resonance shear measuring method according to claim 1, wherein the sample is a thin film.
[claim4]
4. The resonance shear measuring method according to claim 1, wherein the sample is liquid.
[claim5]
5. The resonance shear measuring method according to claim 1, wherein the sample is a liquid crystal.
[claim6]
6. The resonance shear measuring method according to claim 1, wherein the sample has a thickness in nanometer size.
[claim7]
7. The resonance shear measuring method according to claim 1 or 2, wherein the sample has a surface modified by an adsorption or a chemical modification method.
[claim8]
8. The resonance shear measuring method according to claim 1 or 2, wherein the resonance shear curve is a frequency characteristics of shear response of the sample.
[claim9]
9. An apparatus for resonance shear measurement comprising: a waveform generator;
a power source to which the waveform generator is connected;
a resonance shear measurement unit to which the power source is connected and an input signal U in is applied;
a displacement gauge to which the resonance shear measurement unit is connected;
a resonance shear signal analyzer to which the displacement gauge and the power source are connected and to which an output signal U out along with an input signal U in are applied, the resonance shear signal analyzer comprising: (a) a timer section, (b) a Fourier transformation section to which the timer section and the displacement gauge are connected, (c) an amplitude spectrum generation section to which the Fourier transformation section is connected, (d) a normalization section of amplitude (U out /U in), (e) a resonance shear curve producing section;
anda computer to which the waveform generator and the resonance shear signal analyzer are connected.
[claim10]
10. A twin-path type shear stress measurement method, wherein a shear stress measurement of a sample is performed by a combination of two methods: one method being a twin-path type measurement method for a distance between surfaces of the sample by irradiating a laser light to a mirror attached to a back side of a bottom disk holder and by detecting a phase change of the reflected light from the mirror, and the other method being the measurement method to measure rheological properties and friction/lubrication properties of the sample from a resonance curve.
[claim11]
11. A twin-path type apparatus for shear stress measurement comprising: (a) a precise shear device to give a horizontal displacement to a top disk holder, (b) a displacement gauge to detect the horizontal displacement of the top disk holder, (c) a fixing unit for fixing a lower surface of the sample, the unit comprising a leaf spring which holds at the front end a bottom disk holder, and a mirror disposed on a back side of the bottom disk holder, (d) a driving apparatus to drive upward and downward the bottom disk holder by driving the fixing unit for fixing the lower surface of the sample, (e) a twin-path type measurement unit for measuring a distance between surfaces, the unit irradiating a laser light to the mirror and measuring a distance between the upper surface of the sample and the lower surface of the sample based on a phase change of a reflected light from the mirror, wherein rheological properties and friction/lubrication properties of the sample are measured per distance between the upper surface of the sample and the lower surface of the sample.
[claim12]
12. The twin-path type apparatus for shear stress measurement according to claim 11, wherein measurement on the rheological properties and friction/lubrication properties of the sample is performed based on a resonance curve of the sample.
[claim13]
13. The twin-path type apparatus for shear stress measurement according to claim 11 or 12, wherein the sample is a transparent sample or an opaque sample.
[claim14]
14. The twin-path type apparatus for shear stress measurement according to claim 11 or 12, wherein the sample is a liquid thin film.
[claim15]
15. The twin-path type apparatus for shear stress measurement according to claim 11 or 12, wherein the sample is a liquid crystal thin film.
[claim16]
16. The twin-path type apparatus for shear stress measurement according to claim 11 or 12, wherein the sample is an adsorption layer such as polymer and/or surfactant or a chemically modified film.
[claim17]
17. The twin-path type apparatus for shear stress measurement according to claim 11 or 12, wherein either one or both of the top disk holder and the bottom disk holder are opaque substrates.
  • 出願人(英語)
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY
  • 発明者(英語)
  • KURIHARA KAZUE
  • SAKUMA HIROSHI
  • MIZUKAMI MASASHI
国際特許分類(IPC)
欧州特許分類/主・副
  • G01N019/04
  • S01N203/00F4
指定国 Contracting States: AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR
参考情報 (研究プロジェクト等) CREST Creation of Novel Nano-material/System Synthesized by Self-organization for Medical Use AREA
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