TOP > 外国特許検索 > CARBON FIBER NONWOVEN FABRIC, CARBON FIBERS, METHOD FOR PRODUCING THE CARBON FIBER NONWOVEN FABRIC, METHOD FOR PRODUCING CARBON FIBERS, ELECTRODE, BATTERY, AND FILTER

CARBON FIBER NONWOVEN FABRIC, CARBON FIBERS, METHOD FOR PRODUCING THE CARBON FIBER NONWOVEN FABRIC, METHOD FOR PRODUCING CARBON FIBERS, ELECTRODE, BATTERY, AND FILTER 実績あり

外国特許コード F110004992
整理番号 S2010-1014-N0
掲載日 2011年8月3日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2010JP066156
国際公開番号 WO 2011/089754
国際出願日 平成22年9月17日(2010.9.17)
国際公開日 平成23年7月28日(2011.7.28)
優先権データ
  • 特願2010-011457 (2010.1.21) JP
発明の名称 (英語) CARBON FIBER NONWOVEN FABRIC, CARBON FIBERS, METHOD FOR PRODUCING THE CARBON FIBER NONWOVEN FABRIC, METHOD FOR PRODUCING CARBON FIBERS, ELECTRODE, BATTERY, AND FILTER 実績あり
発明の概要(英語) Disclosed are carbon fibers having a large surface area, high graphitization degree, small fiber diameter and reduced variability (or a nonwoven fabric formed of the carbon fibers). Also disclosed is a method for producing a carbon fiber nonwoven fabric, which comprises: a dispersion liquid preparation step in which a dispersion liquid containing a resin and pitch is prepared; an electrospinning step in which a nonwoven fabric composed of carbon fiber precursors is formed from the dispersion liquid by electrospinning; and a modification step in which the carbon fiber precursors of the nonwoven fabric obtained in the electrospinning step are modified into carbon fibers.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • Hiramatsu Sangyo Co., Ltd.
  • Shinshu University
  • 発明者(英語)
  • KITANO Takahiro
  • OKINO Fujio
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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