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Natural-superlattice homologous single crystal thin film, method for preparation thereof, and device using said single crystal thin film 実績あり

外国特許コード F110005315
整理番号 E06007WO
掲載日 2011年8月31日
出願国 アメリカ合衆国
出願番号 49424702
公報番号 20050039670
公報番号 7061014
出願日 平成14年10月31日(2002.10.31)
公報発行日 平成17年2月24日(2005.2.24)
公報発行日 平成18年6月13日(2006.6.13)
国際出願番号 JP2002011404
国際公開番号 WO2003040441
国際出願日 平成14年10月31日(2002.10.31)
国際公開日 平成15年5月15日(2003.5.15)
優先権データ
  • 特願2001-340066 (2001.11.5) JP
  • 特願2002-266012 (2002.9.11) JP
  • 2002WO-JP11404 (2002.10.31) WO
発明の名称 (英語) Natural-superlattice homologous single crystal thin film, method for preparation thereof, and device using said single crystal thin film 実績あり
発明の概要(英語) (US7061014)
Disclosed is a natural-superlattice homologous single-crystal thin film, which includes a complex oxide which is epitaxially grown on either one of a ZnO epitaxial thin film formed on a single-crystal substrate, the single-crystal substrate after disappearance of the ZnO epitaxial thin film and a ZnO single crystal.
The complex oxide is expressed by the formula: M1M2O3 (ZnO)m, wherein M1 is at least one selected from the group consisting of Ga, Fe, Sc, In, Lu, Yb, Tm, Er, Ho and Y, M2 is at least one selected from the group consisting of Mn, Fe, Ga, In and Al, and m is a natural number of 1 or more.
A natural-superlattice homologous single-crystal thin film formed by depositing the complex oxide and subjecting the obtained layered film to a thermal anneal treatment can be used in optimal devices, electronic devices and X-ray optical devices.
特許請求の範囲(英語) [claim1]
1. A natural-superlattice homologous single-crystal thin film comprising a complex oxide which is epitaxially grown on a ZnO epitaxial thin film, said complex oxide being expressed by the following formula:
M1M2O3 (ZnO)m,wherein M1 is at least one selected from the group consisting of Ga, Fe, Sc, In, Lu, Yb, Tm, Er, Ho and Y, M2 is at least one selected from the group consisting of Mn, Fe, Ga, In and Al, andm is a natural number of 1 or more and wherein said thin film has a natural-superlattice homologous single-crystal structure.
[claim2]
2. A natural-superlattice homologous single-crystal thin film comprising a complex oxide which is epitaxially grown on a ZnO epitaxial thin film, wherein said ZnO epitaxial thin film is grown on a single-crystal substrate in advance of the growth of said complex oxide, and vanished during the growth of said complex oxide to allow said epitaxially grown complex oxide to reside directly on said single-crystal substrate,wherein said complex oxide is expressed by the following formula:
M1M2O3 (ZnO)m,wherein M1 is at least one selected from the group consisting of Ga, Fe, Sc, In, Lu, Yb, Tm, Er, Ho and Y, M2 is at least one selected from the group consisting of Mn, Fe, Ga, In and Al, andm is a natural number of 1 or more, andwherein said thin film has a natural-superlattice homologous single-crystal structure.
[claim3]
3. A natural-superlattice homologous single-crystal thin film comprising a complex oxide which is epitaxially grown on a ZnO single crystal, said complex oxide being expressed by the following formula:
M1M2O3 (ZnO)m,wherein M1 is at least one selected from the group consisting of Ga, Fe, Sc, In, Lu, Yb, Tm, Er, Ho and Y, M2 is at least one selected from the group consisting of Mn, Fe, Ga, In and Al, andm is a natural number of 1 or more, andwherein said thin film has natural-superlattice homologous single-crystal structure.
[claim4]
4. The homologous single-crystal thin film as defined in either one of claims 1 to 3, wherein the difference of said m in the thickness direction of said thin film is+-1 or less.
[claim5]
5. The homologous single-crystal thin film as defined in either one of claims 1 to 3, wherein said m is continuously changed in the thickness direction of said thin film.
[claim6]
6. The homologous single-crystal thin film as defined in either one of claims 1 to 3, which includes a surface region which has atomic level smoothness and an area of 0.5 mu m * 0.5 mu m.
[claim7]
7. A method of producing a natural-superlattice homologous single-crystal thin film, comprising: depositing an epitaxially grown complex oxide thin film on either one of a ZnO single crystal and a ZnO epitaxial thin film, said complex oxide being expressed by the formula M1M2O3(ZnO)n (wherein: M1 is at least one selected from the group consisting of Ga, Fe, Sc, In, Lu, Yb, Tm, Er, Ho and Y;
M2 is at least one selected from the group consisting of Mn, Fe, Ga, In and Al;
and n is a natural number of 1 or more), andsubjecting said deposited film to a thermal anneal treatment,wherein said thin film has a natural-superlattice homologous single-crystal structure.
[claim8]
8. The method as defined in claim 7, wherein said thermal anneal treatment is performed while covering said deposited film with a high-melting-point compound plate to prevent the vaporization of ZnO from said deposited film.
[claim9]
9. The method as defined in claim 7, wherein said thermal anneal treatment is performed under the presence of ZnO vapor to prevent the vaporization of ZnO from said deposited film.
[claim10]
10. An optical, X-ray optical or electronic device comprising the homologous single-crystal thin film as defined in either one of claims 1 to 3.
[claim11]
11. A transparent-thin-film field-effect transistor comprising an active layer consisting of the homologous single-crystal thin film as defined in either one of claims 1 to 3, wherein said M1M2O3 (ZnO)m is InMO3 (ZnO)m, wherein M is at least one selected from the group consisting of In, Fe, Ga and Al, and m is an integer in the range of 1 to less than 50.
[claim12]
12. The transparent-thin-film field-effect transistor as defined in claim 11, wherein said homologous single-crystal thin film is formed on a heat-resistant transparent oxide single-crystal substrate.
  • 発明者/出願人(英語)
  • HOSONO HIDEO
  • OTA HIROMICHI
  • ORITA MASAHIRO
  • UEDA KAZUSHIGE
  • HIRANO MASAHIRO
  • KAMIYA TOSHIO
  • HOYA
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY
国際特許分類(IPC)
米国特許分類/主・副
  • 257/43
  • 257/9
  • 257/15
  • 257/16
  • 257/17
  • 257/18
  • 257/19
  • 257/20
  • 257/21
  • 257/22
  • 257/28
  • 257/E21.411
  • 257/E29.147
  • 257/E29.151
参考情報 (研究プロジェクト等) ERATO HOSONO Transparent ElectroActive Materials AREA
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