TOP > 外国特許検索 > METHOD FOR PRODUCING STRONGLY ACIDIC ZIRCONIUM PARTICLES, METHOD FOR PRODUCING PROTON CONDUCTING MATERIAL AND PROTON CONDUCTING FILM, PROTON CONDUCTING FILM, ELECTRODE FOR FUEL CELL, FILM-ELECTRODE JOINED BODY, FUEL CELL

METHOD FOR PRODUCING STRONGLY ACIDIC ZIRCONIUM PARTICLES, METHOD FOR PRODUCING PROTON CONDUCTING MATERIAL AND PROTON CONDUCTING FILM, PROTON CONDUCTING FILM, ELECTRODE FOR FUEL CELL, FILM-ELECTRODE JOINED BODY, FUEL CELL

外国特許コード F110005359
整理番号 S2011-0170-N0
掲載日 2011年9月2日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2010JP055242
国際公開番号 WO 2011/018908
国際出願日 平成22年3月25日(2010.3.25)
国際公開日 平成23年2月17日(2011.2.17)
優先権データ
  • 特願2009-187729 (2009.8.13) JP
  • 特願2009-272239 (2009.11.30) JP
  • PCT/JP2010/052852 (2010.2.24) WO
発明の名称 (英語) METHOD FOR PRODUCING STRONGLY ACIDIC ZIRCONIUM PARTICLES, METHOD FOR PRODUCING PROTON CONDUCTING MATERIAL AND PROTON CONDUCTING FILM, PROTON CONDUCTING FILM, ELECTRODE FOR FUEL CELL, FILM-ELECTRODE JOINED BODY, FUEL CELL
発明の概要(英語) The disclosed method enables zirconium sulfophenyl phosphonate, zirconium sulfate, or zirconia sulfate, which are high performance materials as proton conducting materials and which have high catalytic activity, to be produced at a low temperature by means of adding and reacting sulfophenyl phosphonic acid or sulfuric acid with zirconium nanoparticles, which are a precursor of strongly acidic zirconium particles, and which are obtained by reacting zirconium alkoxide, zirconium butoxide as a chelating agent, and nitric acid as a catalyst in isopropyl alcohol as a solvent.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • TOKYO INSTITUTE OF TECHNOLOGY
  • 発明者(英語)
  • YAMAGUCHI, Takeo
  • KIKUCHI, Yuma
  • Lee, Ju-Myeung
  • OHASHI, Hidenori
  • TAMAKI, Takanori
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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