TOP > 外国特許検索 > CHAMBER FOR OPTICAL OBSERVATION, METHOD FOR OPTICALLY OBSERVING SAMPLE, AND METHOD FOR MANUFACTURING LOWER TRANSPARENT PLATE

CHAMBER FOR OPTICAL OBSERVATION, METHOD FOR OPTICALLY OBSERVING SAMPLE, AND METHOD FOR MANUFACTURING LOWER TRANSPARENT PLATE コモンズ

外国特許コード F110005438
整理番号 S2009-0942-C0
掲載日 2011年9月6日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2010JP060748
国際公開番号 WO 2011/010525
国際出願日 平成22年6月24日(2010.6.24)
国際公開日 平成23年1月27日(2011.1.27)
優先権データ
  • 特願2009-170605 (2009.7.21) JP
発明の名称 (英語) CHAMBER FOR OPTICAL OBSERVATION, METHOD FOR OPTICALLY OBSERVING SAMPLE, AND METHOD FOR MANUFACTURING LOWER TRANSPARENT PLATE コモンズ
発明の概要(英語) Disclosed is a chamber for optical observation wherein a sample put therein is not only hard to evaporate but also hard to adsorb, and the motility of the sample and the like can be more accurately evaluated. Specifically disclosed is a chamber for optical observation, which is provided with a lower transparent plate for mounting a sample thereon, and an upper transparent plate for covering the upper side of the sample therewith, wherein the lower transparent plate is formed by a material having flexibility, and when the sample is mounted on the central portion of the lower transparent plate and covered with the upper transparent plate, the central portion of the lower transparent plate is dented by the weight thereof and the weight of the sample, and the peripheral edge portion of the lower transparent plate is brought into contact with the upper transparent plate in that state, thereby being able to seal the sample between the upper transparent plate and the lower transparent plate.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • NATIONAL UNIVERSITY CORPORATION OKAYAMA UNIVERSITY
  • 発明者(英語)
  • MATSUURA, Koji
  • FUNAHASHI, Hiroaki
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)

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