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MAGNETIC LEVITATION CONTROL DEVICE AND HYBRID TYPE MAGNETIC BEARING 新技術説明会

外国特許コード F110005439
整理番号 S2009-0784-C0
掲載日 2011年9月6日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2010JP004512
国際公開番号 WO 2011/007544
国際出願日 平成22年7月12日(2010.7.12)
国際公開日 平成23年1月20日(2011.1.20)
優先権データ
  • 特願2009-167937 (2009.7.16) JP
発明の名称 (英語) MAGNETIC LEVITATION CONTROL DEVICE AND HYBRID TYPE MAGNETIC BEARING 新技術説明会
発明の概要(英語) A bias magnetic flux (10) is formed in such a way as to pass through an electromagnetic core (1) of an electromagnet (20), and furthermore, a bypass magnetic path (9A) constituting a magnetic path for a control magnetic flux (9) is formed in parallel with a permanent magnet (6), with the result that a bypass magnetic path (9A) is magnetized in such a direction as to prevent the passage of the bias magnetic flux (10). Due to this arrangement, even if the permanent magnet (6) and the electromagnet (20) are installed in positions where the magnetic flux of the permanent magnet (6) and that of the electromagnet (20) are mutually superimposed on each other, still the control magnetic flux (9) formed by the electromagnet (20) passes through the bypass magnetic path (9A), thereby permitting the loss of the control magnetic flux (9) to be curbed. By virtue of the above, it is possible to install the permanent magnet (6) and the electromagnet (20) in positions where the magnetic flux of the permanent magnet (6) and that of the electromagnet (20) are mutually superimposed on each other, leading to miniaturization of the pertinent device.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • IBARAKI UNIVERSITY
  • 発明者(英語)
  • MASUZAWA, Toru
  • SASAKI, Eisuke
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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