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Composite material, method for producing the same, and apparatus for producing the same 実績あり

外国特許コード F110005595
整理番号 N072-16WO
掲載日 2011年9月9日
出願国 アメリカ合衆国
出願番号 99190209
公報番号 20110123813
公報番号 9028982
出願日 平成21年3月2日(2009.3.2)
公報発行日 平成23年5月26日(2011.5.26)
公報発行日 平成27年5月12日(2015.5.12)
国際出願番号 JP2009053871
国際公開番号 WO2010021166
国際出願日 平成21年3月2日(2009.3.2)
国際公開日 平成22年2月25日(2010.2.25)
優先権データ
  • 特願2008-211184 (2008.8.19) JP
  • 2009JP053871 (2009.3.2) WO
発明の名称 (英語) Composite material, method for producing the same, and apparatus for producing the same 実績あり
発明の概要(英語) Disclosed is a composite material wherein adhesion between a silicon surface and a plating material is enhanced.
A method and an apparatus for producing the composite material are also disclosed.
The method for producing a composite material comprises a dispersion/allocation step wherein the surface of a silicon substrate (102), which is a matrix provided with a silicon layer at least as the outermost layer, is immersed into a first solution containing gold (Au) ions, so that particulate or island-shaped gold (Au) serving as a first metal and substituted with a part of the silicon layer are dispersed/allocated on the matrix surface, and a plating step wherein the silicon substrate (102) is immersed into a second solution (24), which contains a reducing agent to which gold (Au) exhibits catalyst activity and metal ions which can be reduced by the reducing agent, so that the surface of the silicon substrate (102) is covered with the metal or an alloy of the metal (108) which is formed by autocatalytic electroless plating using gold (Au) as a starting point.
特許請求の範囲(英語) [claim1]
1. A composite material comprising: a matrix having a silicon layer as an uppermost layer;
gold particles on a surface of the matrix in shapes of particles or islands, the gold particles displacing part of the silicon layer; and
a metal or an alloy of the metal covering the surface of the matrix, the metal or the alloy of the metal being formed by autocatalytic electroless plating and adhering to the surface with an adhesibility such that the metal or alloy thereof cannot be detached from the surface when tested according to Japanese Industrial Standard test H8504, wherein the gold particles serve as starting points for the autocatalytic electroless plating and wherein the gold particles are catalytically active with respect to a reducing agent employed for the autocatalytic electroless plating.
[claim2]
2. The composite material according to claim 1, wherein the gold particles are dispersed on the surface of the matrix at a particle density ranging from 3 * 1010 particles/cm2 to 1 * 1013 particles/cm2.
[claim3]
3. The composite material according to claim 1, wherein the silicon layer comprises single-crystalline silicon, and the surface of the matrix comprising the gold particles has a root-mean-square roughness (Rq) ranging from 1.1 nm to 1.6 nm.
[claim4]
4. The composite material according to claim 1, wherein the silicon layer comprises a material selected from the group consisting of single-crystalline silicon, polycrystalline silicon, microcrystalline silicon and amorphous silicon.
[claim5]
5. The composite material according to claim 1, wherein the root-mean-square roughness (Rq) of the surface of the matrix comprising the gold particles is increased by an amount ranging from 0.9 nm to 1.5 nm relative to a root-mean-square roughness (Rq) of the surface of the matrix in the absence of the gold particles.
[claim6]
6. A composite material comprising: a matrix having a silicon layer as an uppermost layer;
gold particles on a surface of the matrix in shapes of particles or islands, the gold particles displacing part of the silicon layer; and
a metal or an alloy of the metal covering the surface of the matrix and adhering to the surface with an adhesibility such that the metal or alloy thereof cannot be detached from the surface when tested according to Japanese Industrial Standard test H8504.
[claim7]
7. The composite material according to claim 6, wherein the gold particles are dispersed on the surface of the matrix at a particle density ranging from 3 * 1010 particles/cm2 to 1 * 1013 particles/cm2.
[claim8]
8. The composite material according to claim 6, wherein the silicon layer comprises single-crystalline silicon, and the surface of the matrix comprising the gold particles has a root-mean-square roughness (Rq) ranging from 1.1 nm to 1.6 nm.
[claim9]
9. The composite material according to claim 6, wherein the silicon layer comprises a material selected from the group consisting of single-crystalline silicon, polycrystalline silicon, microcrystalline silicon and amorphous silicon.
[claim10]
10. The composite material according to claim 6, wherein the root-mean-square roughness (Rq) of the surface of the matrix comprising the gold particles is increased by an amount ranging from 0.9 nm to 1.5 nm relative to a root-mean-square roughness (Rq) of the surface of the matrix in the absence of the gold particles.
  • 発明者/出願人(英語)
  • YAE SHINJI
  • HIRANO TATSUYA
  • MATSUDA HITOSHI
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY
国際特許分類(IPC)
米国特許分類/主・副
  • 428/699
  • 428/446
  • 428/450
  • 977/721
  • 977/779
参考情報 (研究プロジェクト等) CREST Development of Advanced Nanostructured Materials for Energy Conversion and Storage AREA
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