TOP > 外国特許検索 > SUBSTRATUM FOR SUPPLYING CELLS/TISSUES, CELL/TISSUE SUPPLY MATERIAL AND PROCESS FOR PRODUCTION THEREOF, METHOD FOR REGENERATION OF TISSUES, AND PROCESS FOR PRODUCTION OF POROUS MATERIAL

SUBSTRATUM FOR SUPPLYING CELLS/TISSUES, CELL/TISSUE SUPPLY MATERIAL AND PROCESS FOR PRODUCTION THEREOF, METHOD FOR REGENERATION OF TISSUES, AND PROCESS FOR PRODUCTION OF POROUS MATERIAL

外国特許コード F110005877
整理番号 S2009-0968-C0
掲載日 2011年11月9日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2010JP064193
国際公開番号 WO 2011/021712
国際出願日 平成22年8月23日(2010.8.23)
国際公開日 平成23年2月24日(2011.2.24)
優先権データ
  • 特願2009-192600 (2009.8.21) JP
発明の名称 (英語) SUBSTRATUM FOR SUPPLYING CELLS/TISSUES, CELL/TISSUE SUPPLY MATERIAL AND PROCESS FOR PRODUCTION THEREOF, METHOD FOR REGENERATION OF TISSUES, AND PROCESS FOR PRODUCTION OF POROUS MATERIAL
発明の概要(英語) Disclosed is a substratum for supplying cells/tissues, which comprises a porous material having a thin film surface and a porous surface and can be used for regenerative medicine. Also disclosed is a cell/tissue supply material which has cultured cells/tissues on the porous surface. Cells are seeded and cultured on the porous surface of the porous material to form/regenerate tissues. A solution prepared by adding a water-soluble organic solvent to an aqueous silk protein solution is placed in a mold of which the bottom or the upper surface has been roughened, and the resulting product is frozen and subsequently thawed. In this manner, a porous material having a thin film surface and a porous surface can be produced.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • NATIONAL INSTITUTE OF AGROBIOLOGICAL SCIENCES
  • KYOTO UNIVERSITY
  • 発明者(英語)
  • TAMADA, Yasushi
  • KOJIMA, Katsura
  • TOMITA, Naohide
  • HIRAKATA, Eiichi
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
ライセンスをご希望の方、特許の内容に興味を持たれた方は、下記までご連絡ください。

PAGE TOP

close
close
close
close
close
close