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MANUFACTURING METHOD AND DEVICE FOR COMPOSITION IN WHICH DISPERSED PHASE IS FINELY DISPERSED INTO CONTINUOUS PHASE 新技術説明会

外国特許コード F110005935
整理番号 QP080213-PC
掲載日 2011年11月28日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2010JP071658
国際公開番号 WO 2011/068191
国際出願日 平成22年12月3日(2010.12.3)
国際公開日 平成23年6月9日(2011.6.9)
優先権データ
  • 特願2009-276136 (2009.12.4) JP
発明の名称 (英語) MANUFACTURING METHOD AND DEVICE FOR COMPOSITION IN WHICH DISPERSED PHASE IS FINELY DISPERSED INTO CONTINUOUS PHASE 新技術説明会
発明の概要(英語) Disclosed is a method whereby a composition in which a dispersed phase is finely dispersed in a continuous phase with low polydispersity can be produced with excellent production efficiency. The composition is manufactured using a manufacturing process comprising the following steps: (A) a swirl flow of a continuous phase liquid is passed through a cylinder configured so that a part or all of the peripheral surface is a porous membrane; (B1) a dispersed phase liquid is supplied to the swirl flow via the porous membrane and dispersed phase particles are formed on the porous membrane; and (B2) the dispersed phase particles formed on the porous membrane are detached by the shear force of the swirl flow. The cylinder has an inflow port for the continuous phase liquid on the peripheral surface near one end of the cylinder and an inlet tube which extends from the inflow port in a direction that is substantially perpendicular to the axis of the cylinder and tangential to the cylinder. It is preferable for step (A) to be configured so that the continuous phase liquid is made to flow in to the cylinder from a direction that is substantially perpendicular to the axis of the cylinder and tangential to the inner wall of the cylinder by means of the inlet tube.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION
  • 発明者(英語)
  • SHIMODA, Mitsuya
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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