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POSITIVE ELECTRODE MATERIAL FOR LITHIUM ION SECONDARY BATTERY, AND PROCESS FOR PRODUCTION THEREOF 新技術説明会

外国特許コード F110006058
整理番号 S2009-1149
掲載日 2011年12月28日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2010JP067217
国際公開番号 WO 2011/043255
国際出願日 平成22年10月1日(2010.10.1)
国際公開日 平成23年4月14日(2011.4.14)
優先権データ
  • 特願2009-232705 (2009.10.6) JP
発明の名称 (英語) POSITIVE ELECTRODE MATERIAL FOR LITHIUM ION SECONDARY BATTERY, AND PROCESS FOR PRODUCTION THEREOF 新技術説明会
発明の概要(英語) Disclosed are: a positive electrode material for a lithium ion secondary battery, which can be produced by a more simplified production process and in which an electrically conductive auxiliary agent can be attached on the surface of particles of the positive electrode material with high efficiency; and a process for producing the positive electrode material. The process for producing a positive electrode material for a lithium ion secondary battery is characterized by comprising the steps of: (1) preparing a batch which comprises lithium methaphosphate (LiPO3) powder and a transition metal oxide represented by chemical formula MO, MO2, M3O4 or M2O3 (wherein M represents at least one element selected from Fe, Mn, Co and Ni) in such a manner that the molar ratio among lithium, phosphorus and a transition metal is 1:1:(0.8-1.2); (2) adding a reducing agent to prepare a mixed powder; and (3) burning the mixed powder to form crystals of LiMPO4 (wherein M represents at least one element selected from Fe, Mn, Co and Ni) or crystals composed of a solid solution of the aforementioned LiMPO4.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • National University Corporation Nagaoka University of Technology
  • 発明者(英語)
  • HONMA Tsuyoshi
  • KOMATSU Takayuki
  • TOGASHI Takuya
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)

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