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WATERMARK INFORMATION EMBEDDING APPARATUS, WATERMARK INFORMATION PROCESSING SYSTEM, WATERMARK INFORMATION EMBEDDING METHOD, AND PROGRAM

外国特許コード F120006192
整理番号 S2009-0760
掲載日 2012年2月7日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2010JP059393
国際公開番号 WO 2010/140639
国際出願日 平成22年6月2日(2010.6.2)
国際公開日 平成22年12月9日(2010.12.9)
優先権データ
  • 特願2009-135301 (2009.6.4) JP
発明の名称 (英語) WATERMARK INFORMATION EMBEDDING APPARATUS, WATERMARK INFORMATION PROCESSING SYSTEM, WATERMARK INFORMATION EMBEDDING METHOD, AND PROGRAM
発明の概要(英語) Provided are a watermark information embedding apparatus, a watermark information processing system, a watermark information embedding method and a program wherein two-dimensional codes can be provided which enable the detection of copies. The watermark information embedding apparatus comprises a first wavelet transforming unit (12), a watermark information embedding unit (14) and an inverse wavelet transforming unit (150). The first wavelet transforming unit (12) subjects an original image of two-dimensional code to a discrete wavelet transform, thereby decomposing the original image into frequency components: LL, LH, HL and HH components. The watermark information embedding unit (14) embeds, as high frequency components in slanting directions, watermark information into the HH component. The inverse wavelet transforming unit (150) subjects the LL, LH and HL frequency components and the HH component, into which the watermark information has been embedded, to an inverse discrete wavelet transform, thereby reconfiguring the two-dimensional code.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • KAGOSHIMA UNIVERSITY
  • A.T COMMUNICATIONS CO., LTD.
  • 発明者(英語)
  • ONO Satoshi
  • NAKAYAMA Shigeru
  • TSUTSUMI Makoto
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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