TOP > 外国特許検索 > ANTIBACTERIAL COMPOSITION AND ANTIVIRAL COMPOSITION EACH CONTAINING SILICON-CONTAINING COMPOUND, ANTIBACTERIALIZING METHOD, CLEANING/MOUTH CLEANING METHOD, AND METHOD FOR IMMOBILIZING ANTIBACTERIAL AGENT OR ANTIVIRAL AGENT

ANTIBACTERIAL COMPOSITION AND ANTIVIRAL COMPOSITION EACH CONTAINING SILICON-CONTAINING COMPOUND, ANTIBACTERIALIZING METHOD, CLEANING/MOUTH CLEANING METHOD, AND METHOD FOR IMMOBILIZING ANTIBACTERIAL AGENT OR ANTIVIRAL AGENT

外国特許コード F120006234
整理番号 S2009-0227-N0
掲載日 2012年2月14日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2009JP068929
国際公開番号 WO 2010/073825
国際出願日 平成21年11月5日(2009.11.5)
国際公開日 平成22年7月1日(2010.7.1)
優先権データ
  • 特願2008-329036 (2008.12.25) JP
  • 特願2009-205296 (2009.9.4) JP
  • 特願2009-233013 (2009.10.7) JP
発明の名称 (英語) ANTIBACTERIAL COMPOSITION AND ANTIVIRAL COMPOSITION EACH CONTAINING SILICON-CONTAINING COMPOUND, ANTIBACTERIALIZING METHOD, CLEANING/MOUTH CLEANING METHOD, AND METHOD FOR IMMOBILIZING ANTIBACTERIAL AGENT OR ANTIVIRAL AGENT
発明の概要(英語) Disclosed is an antibacterial composition which is highly safe and has excellent antibacterial properties, by using a silicon-containing compound that is obtained by a specific manufacturing method. The antibacterial composition has a more stable antibacterial component, and is capable of providing teeth with antibacterial properties, while being also capable of cleaning an object or the mouth. Also disclosed are: an antiviral composition which is highly safe and has excellent virus deactivation ability; an antibacterializing method, a cleaning method and a mouth cleaning method, each using the antibacterial composition or the antiviral composition; and a method for immobilizing an antibacterial agent or an antiviral agent. The antibacterial composition is characterized by containing a silicon-containing compound which is represented by general formula (1) and obtained by reacting a specific triethoxysilyl compound in an ethanol solvent.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • HIROSHIMA UNIVERSITY
  • 発明者(英語)
  • NIKAWA, Hiroki
  • TAKEDA, Hironori
  • KAKIHARA, Toshio
  • SAKAGUCHI, Takemasa
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW(UTILITY MODEL),BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN,HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)

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