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PHOTOCATALYST COMPOSITION AND METHOD FOR PRODUCING A PHOTOCATALYST COMPOSITION 新技術説明会

外国特許コード F120006279
整理番号 SHINGI20111213
掲載日 2012年3月1日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2011JP053946
国際公開番号 WO 2011/148683
国際出願日 平成23年2月23日(2011.2.23)
国際公開日 平成23年12月1日(2011.12.1)
優先権データ
  • 特願2010-121956 (2010.5.27) JP
発明の名称 (英語) PHOTOCATALYST COMPOSITION AND METHOD FOR PRODUCING A PHOTOCATALYST COMPOSITION 新技術説明会
発明の概要(英語) Provided are a photocatalyst composition that can split water into oxygen and hydrogen by absorbing visible light without using redox reagents or sacrificial agents and a method for producing the photocatalyst composition. The photocatalyst composition is configured by bringing a hydrogen-evolving photocatalyst which splits water to evolve hydrogen when irradiated with light in contact with an oxygen-evolving photocatalyst which splits water to evolve oxygen when irradiated with light. The hydrogen-evolving photocatalyst comprises a substance wherein the lower edge of the conduction band is a more negative potential than 0 V, and the substance has a band gap energy of less than 3.0 eV. The oxygen-evolving photocatalyst comprises a substance wherein the potential of the upper edge of the valence band with respect to the standard hydrogen electrode is more positive than 1.23 V, and the substance has a band gap energy less than 3.0 eV. When potentials with respect to the standard hydrogen electrode potential are compared, the Fermi level of said hydrogen-evolving photocatalyst is more negative than or equal to the Fermi level of said oxygen-evolving photocatalyst.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • UNIVERSITY OF YAMANASHI
  • 発明者(英語)
  • IRIE, Hiroshi
  • SATO, Tetsuya
  • KITTA, Taiki
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA(CONSENSUAL PATENT),BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
参考情報 (研究プロジェクト等) 2011年12月13日(火) 山梨大学 新技術説明会
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