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POTENTIAL OBTAINING DEVICE, MAGNETIC FIELD MICROSCOPE, INSPECTION DEVICE AND METHOD OF OBTAINING POTENTIAL コモンズ

外国特許コード F120006346
整理番号 KP09-052PCT
掲載日 2012年3月26日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2011JP054635
国際公開番号 WO 2011/108543
国際出願日 平成23年3月1日(2011.3.1)
国際公開日 平成23年9月9日(2011.9.9)
優先権データ
  • 特願2010-044218 (2010.3.1) JP
発明の名称 (英語) POTENTIAL OBTAINING DEVICE, MAGNETIC FIELD MICROSCOPE, INSPECTION DEVICE AND METHOD OF OBTAINING POTENTIAL コモンズ
発明の概要(英語) Disclosed is a magnetic field obtaining device, wherein a measuring unit (21), which is sufficiently long compared to the width of the region to be measured, is disposed on the measuring surface which satisfies z = .alpha., and wherein in the X' direction orthogonal to the longitudinal direction of the measuring unit (21) scanning is repeated while changing multiple times the angle .theta. which is defined between a given reference direction on the measuring surface and the longitudinal direction of the measuring unit (21). Subsequently, a measured value f (x', .theta.) which is obtained by repeating the scanning, is Fourier transformed, where the coordinate parameter in the X' direction is defined as x', and g(kx', .theta.) is obtained (where kx' is the number of waves in the X' direction). Then, by substituting g (kx', .theta.) into a given two-dimensional potential obtaining formula, [GREEK PHI SYMBOL] (x, y, .alpha.) representing a two-dimensional potential on the measuring surface is obtained. Thus, a two-dimensional potential can be measured with higher resolution using the measuring unit (21) which is sufficiently large compared to the width of the region to be measured.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • National University Corporation Kobe University
  • 発明者(英語)
  • KIMURA, Kenjiro
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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