TOP > 外国特許検索 > METALLIC MATERIAL WHICH IS SOLID SOLUTION OF BODY-CENTERED CUBIC (BCC) STRUCTURE HAVING CONTROLLED CRYSTAL AXIS <001> ORIENTATION, AND PROCESS FOR PRODUCING SAME

METALLIC MATERIAL WHICH IS SOLID SOLUTION OF BODY-CENTERED CUBIC (BCC) STRUCTURE HAVING CONTROLLED CRYSTAL AXIS <001> ORIENTATION, AND PROCESS FOR PRODUCING SAME

外国特許コード F120006363
掲載日 2012年3月27日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2011JP054548
国際公開番号 WO 2011/105609
国際出願日 平成23年2月28日(2011.2.28)
国際公開日 平成23年9月1日(2011.9.1)
優先権データ
  • 特願2010-042132 (2010.2.26) JP
発明の名称 (英語) METALLIC MATERIAL WHICH IS SOLID SOLUTION OF BODY-CENTERED CUBIC (BCC) STRUCTURE HAVING CONTROLLED CRYSTAL AXIS <001> ORIENTATION, AND PROCESS FOR PRODUCING SAME
発明の概要(英語) Provided are a metallic material, e.g., an electromagnetic material (magnetic steel sheet), that has a processed surface along which crystal axes <001> of the metallic material have been distributed by controlling the distribution of the crystal axes <001>, and a process for producing the metallic material. The metallic material, which is, for example, an electromagnetic material (magnetic steel sheet), is obtained by subjecting a metallic material comprising a solid solution of a body-centered cubic (BCC) structure to hot compression at a temperature within a range where the solid solution is constituted only of a BCC phase, thereby distributing crystal axes <001> of the metal along the processed surface of the metallic material. The process is characterized by: heating the metallic material which is, for example, an Fe-Si alloy to a temperature in a range where the alloy is a solid solution constituted only of a BCC phase; and compressing this BCC-phase solid solution at a straining rate at which the solute atom atmosphere appearing in the BCC-phase solid solution governs movements for dislocation and at which grain boundaries are kept movable using, as a power therefor, strain energy that has accumulated in the grains, thereby distributing {100} planes in parallel to the processed surface.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • National University Corporation, Yokohama National University
  • 発明者(英語)
  • FUKUTOMI Hiroshi
  • OKAYASU Kazuto
  • ONUKI Yusuke
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
※ 掲載特許について詳しくお知りになりたい方はHPの「お問い合わせ」ページにてお問い合わせください。

PAGE TOP

close
close
close
close
close
close