TOP > 外国特許検索 > METHOD FOR PRODUCING SUPEROXIDE, METHOD FOR EVALUATING SUPEROXIDE SCAVENGING ABILITY, DEVICE FOR PRODUCING SUPEROXIDE, AND DEVICE FOR EVALUATING SUPEROXIDE SCAVENGING ABILITY

METHOD FOR PRODUCING SUPEROXIDE, METHOD FOR EVALUATING SUPEROXIDE SCAVENGING ABILITY, DEVICE FOR PRODUCING SUPEROXIDE, AND DEVICE FOR EVALUATING SUPEROXIDE SCAVENGING ABILITY コモンズ

外国特許コード F120006404
整理番号 9005
掲載日 2012年4月5日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2010JP072050
国際公開番号 WO 2011/071088
国際出願日 平成22年12月8日(2010.12.8)
国際公開日 平成23年6月16日(2011.6.16)
優先権データ
  • 特願2009-279015 (2009.12.9) JP
発明の名称 (英語) METHOD FOR PRODUCING SUPEROXIDE, METHOD FOR EVALUATING SUPEROXIDE SCAVENGING ABILITY, DEVICE FOR PRODUCING SUPEROXIDE, AND DEVICE FOR EVALUATING SUPEROXIDE SCAVENGING ABILITY コモンズ
発明の概要(英語) Provided are a method for easily and stably producing a superoxide by selectively generating the superoxide or a radical containing the superoxide at a high purity; a method for easily evaluating the superoxide scavenging ability of a subject sample; a device for easily and stably producing a superoxide by selectively generating the superoxide or a radical containing the superoxide at a high purity; and a device for easily evaluating the superoxide scavenging ability of a subject sample. The aforesaid method for producing a superoxide comprises: a step (a) for preparing a solution for determination; a step (b) for forming a spin adduct/radical for determination; a step (c) for acquiring a spectrum for determination; a step (d) for determining similarity; a step (e) for acquiring flavin concentration; a step (f) for preparing a starting material solution; and a step (g) for generation.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • SAPPORO MEDICAL UNIVERSITY
  • 発明者(英語)
  • Fujii Hirotada
  • KOHRI Shunji
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)

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