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NOVEL LACTOBACILLUS AND METHOD FOR PRODUCING L-LACTIC ACID USING SAME 新技術説明会

外国特許コード F120006440
整理番号 QP110109-PC
掲載日 2012年4月16日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2011JP066253
国際公開番号 WO 2012/008585
国際出願日 平成23年7月15日(2011.7.15)
国際公開日 平成24年1月19日(2012.1.19)
優先権データ
  • 特願2011-020593 (2011.2.2) JP
  • 特願2010-162227 (2010.7.16) JP
発明の名称 (英語) NOVEL LACTOBACILLUS AND METHOD FOR PRODUCING L-LACTIC ACID USING SAME 新技術説明会
発明の概要(英語) During L-lactic acid fermentation of non-food biomass, in order to achieve simultaneous saccharification and fermentation, a lactobacillus is needed that is suitable to fermentation with a starting material of a mixture comprising mixed sugars or oligosaccharides formed by enzymatically processing cellulose or hemicellulose. Also, it is necessary to keep in mind that when the starting material is a pentose such as xylose derived from non-food biomass, lactic acid and the same number of moles of acetic acid are formed, and so the molar yield of lactic acid is halved, as well as that high concentrations of L-lactic acid cause inhibition of fermentation, making it difficult to produce high yields of L-lactic acid. In order to resolve such problems, disclosed is a novel lactobacillus. By means of the lactobacillus, with a mixture of glucose and cellobiose as the starting material, it is possible to efficiently produce L-lactic acid at a high optical purity of at least 99.9% without substrate inhibition and with almost no generation of by-products. The disclosed method can be applied to efficient production of L-lactic acid from a non-food biomass starting material.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION
  • 発明者(英語)
  • SONOMOTO, Kenji
  • ZENDO, Takeshi
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA(CONSENSUAL PATENT),BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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