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CONCENTRATED ACID TREATMENT UNIT, CONCENTRATED ACID TREATMENT METHOD, PLANT RESOURCE PHASE SEPARATION TYPE CONVERSION DEVICE AND CONVERSION METHOD

外国特許コード F120006468
掲載日 2012年5月7日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2009JP068149
国際公開番号 WO 2010/047358
国際出願日 平成21年10月21日(2009.10.21)
国際公開日 平成22年4月29日(2010.4.29)
優先権データ
  • 特願2008-273633 (2008.10.23) JP
発明の名称 (英語) CONCENTRATED ACID TREATMENT UNIT, CONCENTRATED ACID TREATMENT METHOD, PLANT RESOURCE PHASE SEPARATION TYPE CONVERSION DEVICE AND CONVERSION METHOD
発明の概要(英語) Disclosed are a plant phase separation type conversion device, conversion method, concentrated acid treatment unit, and concentrated acid treatment method, for efficient and continuous production of lignin derivatives and hydrolysed saccharides from plants. A concentrated acid treatment unit (3) has a reaction unit (20) and a stirring and extraction unit (25), and receives a phenol-sorbed starting material (16) formed by defatting starting material (15) derived from a plant using a solvent (14) and sorbing a sorbing phenol (13) to said material, and releases said material as a mixed solution comprising a phenol solution which includes lignophenol derivatives and a concentrated acid solution which includes products of hydrolysis of cellulose. In the reaction unit (20), the phenol-sorbed starting material (16) is mixed with concentrated acid (21A) by stirring, the cellulose is swelled, the lignin is converted to lignophenol, and some of the cellulose is hydrolysed. The stirring and extraction unit (25) receives the solution to be treated delivered from the reaction unit (20) and extracting phenol (33) is stirred in so that the lignophenol dispersed in the concentrated acid solution is extracted in the extracting phenol.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY
  • KANSAI CHEMICAL ENGINEERING CO., LTD.
  • 発明者(英語)
  • FUNAOKA Masamitsu
  • MIKAME Keigo
  • NODA Hideo
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW(UTILITY MODEL),BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN,HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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