TOP > 外国特許検索 > PROCESS FOR PRODUCTION OF POLYHYDROXYALKANOIC ACID USING GENETICALLY MODIFIED MICROORGANISM HAVING ENOYL-CoA HYDRATASE GENE INTRODUCED THEREIN

PROCESS FOR PRODUCTION OF POLYHYDROXYALKANOIC ACID USING GENETICALLY MODIFIED MICROORGANISM HAVING ENOYL-CoA HYDRATASE GENE INTRODUCED THEREIN

外国特許コード F120006526
整理番号 S2010-0631-C0
掲載日 2012年5月8日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2011JP053861
国際公開番号 WO 2011/105379
国際出願日 平成23年2月22日(2011.2.22)
国際公開日 平成23年9月1日(2011.9.1)
優先権データ
  • 特願2010-043017 (2010.2.26) JP
発明の名称 (英語) PROCESS FOR PRODUCTION OF POLYHYDROXYALKANOIC ACID USING GENETICALLY MODIFIED MICROORGANISM HAVING ENOYL-CoA HYDRATASE GENE INTRODUCED THEREIN
発明の概要(英語) Poly(3-hydroxybutanoic acid-co-3-hydroxyhexnoic acid) [P(3HB-co-3HHx)] having a high 3-hydroxyhexnoic acid fraction can be produced using a plant oil as a base raw material. Disclosed is a process for producing a microorganism capable of producing poly(3-hydroxybutanoic acid-co-3-hydroxyhexnoic acid) having a high 3-hydroxyhexnoic acid fraction using a plant oil as a base raw material, which comprises introducing a gene that encodes an R-hydratase capable of converting a .beta.-oxidation intermediate for a fatty acid to an (R)-3-hydroxyacyl-CoA [R-3HA-CoA] (which is a monomer) into a genetically modified Cupriavidus necator strain imparted with a P(3HB-co-3HHx) production capability.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • Tokyo Institute of Technology
  • 発明者(英語)
  • FUKUI, Toshiaki
  • ORITA, Izumi
  • MIFUNE, Jun
  • KAWASHIMA, Yui
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
詳しくお知りになりたい方は下記「問合せ先」まで直接お問合わせください

PAGE TOP

close
close
close
close
close
close