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MAGNETIC PARTICLES, PROCESS FOR PRODUCING SAME, AND MEDICINAL PREPARATION INCLUDING MAGNETIC PARTICLES

外国特許コード F120006531
整理番号 S2010-0647-C0
掲載日 2012年5月8日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2011JP000638
国際公開番号 WO 2011/096230
国際出願日 平成23年2月4日(2011.2.4)
国際公開日 平成23年8月11日(2011.8.11)
優先権データ
  • 特願2010-025660 (2010.2.8) JP
発明の名称 (英語) MAGNETIC PARTICLES, PROCESS FOR PRODUCING SAME, AND MEDICINAL PREPARATION INCLUDING MAGNETIC PARTICLES
発明の概要(英語) Provided are magnetic particles of a novel structure and a process for producing the magnetic particles. Also provided is a medicinal preparation of a novel structure, the preparation including the magnetic particles. The magnetic-particle-including medicinal preparation (7) comprises: magnetic particles (1) that are hollow inside and comprise a magnetic cage-shaped skeleton which consists of a sintered object obtained from metallic nanoparticles including nanoparticles comprising any of Fe, Co, and Ni and in which the porosity obtained by projecting the sintered object on a two-dimensional plane, processing the projected image in terms of transmission electron microscope image, and determining the proportion of the transparent parts to the whole area inside the contour of the sintered object is 1-50%; and a coating layer (40) with which at least some of the surface layer of each magnetic particle (1) is coated. The medicinal preparation contains a drug (30) within the magnetic cage-shaped skeleton (10) and/or in the coating layer (40).
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • THE JIKEI UNIVERSITY
  • Tokyo Institute of Technology
  • TOHOKU UNIVERSITY
  • 発明者(英語)
  • NAMIKI, Yoshihisa
  • KITAMOTO, Yoshitaka
  • FUCHIGAMI, Teruaki
  • KAWAMURA, Ryo
  • NAKAGAWA, Masaru
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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