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CATALYST FOR REFORMING OXYGEN-CONTAINING HYDROCARBON, AND HYDROGEN OR SYNTHETIC GAS PRODUCTION METHOD AND FUEL CELL SYSTEM USING THE CATALYST

外国特許コード F120006544
整理番号 RX08P16WO
掲載日 2012年5月10日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2008JP056952
国際公開番号 WO 2008/126844
国際出願日 平成20年4月8日(2008.4.8)
国際公開日 平成20年10月23日(2008.10.23)
優先権データ
  • 特願2007-104227 (2007.4.11) JP
  • 特願2007-275772 (2007.10.23) JP
発明の名称 (英語) CATALYST FOR REFORMING OXYGEN-CONTAINING HYDROCARBON, AND HYDROGEN OR SYNTHETIC GAS PRODUCTION METHOD AND FUEL CELL SYSTEM USING THE CATALYST
発明の概要(英語) The object is to improve the catalytic activity of reforming an oxygen-containing hydrocarbon of a cupper-containing metal oxide having a spinel structure, and thus to provide a reforming catalyst having an improved reforming activity and improved durability and a hydrogen or synthetic gas production method and a fuel cell system both using the catalyst. Specifically disclosed are: a catalyst for reforming an oxygen-containing hydrocarbon, which is prepared by the step of firing a mixture of (A) a copper-containing metal oxide having a spinel structure with (B) a solid acid at 300 to 850 [RING ABOVE] C in an atmosphere containing at least oxygen; a method for producing hydrogen or a synthetic gas, which comprises subjecting an oxygen-containing hydrocarbon to any one of various reforming treatments using the catalyst; and a fuel cell system which comprises a reformer having the catalyst and a fuel cell utilizing hydrogen produced by the reformer as a fuel.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • JAPAN SCIENCE AND TECHNOLOGY AGENCY
  • KYOTO UNIVERSITY
  • IDEMITSU KOSAN CO., LTD.
  • 発明者(英語)
  • FAUNGNAWAKIJ, Kajornsak
  • EGUCHI, Koichi
  • KIKUCHI, Ryuji
  • FUKUNAGA, Tetsuya
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH,BR(UTILITY MODEL),BW(UTILITY MODEL),BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM(UTILITY MODEL),DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH,GM,GT,HN,HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME(PETTY PATENT),MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM,PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,SV(UTILITY MODEL),SY,TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN,ZA,ZM,ZW,EP(AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MT,NL,NO,PL,PT,RO,SE,SI,SK,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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