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PHASE CONTROLLER

外国特許コード F120006554
整理番号 S2010-0300
掲載日 2012年5月10日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2010JP073708
国際公開番号 WO 2011/083727
国際出願日 平成22年12月28日(2010.12.28)
国際公開日 平成23年7月14日(2011.7.14)
優先権データ
  • 特願2010-002301 (2010.1.7) JP
発明の名称 (英語) PHASE CONTROLLER
発明の概要(英語) Reflection surfaces (12) composed of a transition metal having a core-level absorption edge in the vicinity of the wavelength of soft X-rays are formed inside a vacuum vessel (14). Furthermore, permanent magnets (13) for generating a magnetic field in a direction perpendicular to the longitudinal direction of the vacuum vessel (14) are disposed at positions on the reflection surfaces (12) where soft X-rays reflect so that the linearly polarized soft X-rays incident on the vacuum vessel (14) are reflected at the positions on the reflection surfaces (12) where the magnetic field is generated a plurality of times and so that magnetic scattering is enhanced by the resonant effect of magnetic circular dichroism when the soft X-rays are reflected at the reflection surfaces (12). This generates a large difference in refractive index between circularly polarized counterclockwise light and circularly polarized clockwise light that constitute the linearly polarized light, and quickly leads to a phase difference between the circularly polarized counterclockwise light and the circularly polarized clockwise light. As a result, the linearly polarized soft X-rays can be converted into circularly polarized light by only a few reflections, or can be reversibly converted from circularly polarized light into linearly polarized light.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • Saitama Medical University
  • 発明者(英語)
  • KURODA, Hiroto
  • BABA, Motoyoshi
  • YONEYA, Shin
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)

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