TOP > 外国特許検索 > IRRADIATION METHOD OF LASER, FREQUENCY ADJUSTMENT METHOD OF PIEZOELECTRIC VIBRATOR USING SAME, AND FREQUENCY-ADJUSTED PIEZOELECTRIC DEVICE USING SAME

IRRADIATION METHOD OF LASER, FREQUENCY ADJUSTMENT METHOD OF PIEZOELECTRIC VIBRATOR USING SAME, AND FREQUENCY-ADJUSTED PIEZOELECTRIC DEVICE USING SAME

外国特許コード F120006575
掲載日 2012年5月14日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2010JP067501
国際公開番号 WO 2011/043357
国際出願日 平成22年10月6日(2010.10.6)
国際公開日 平成23年4月14日(2011.4.14)
優先権データ
  • 特願2009-233031 (2009.10.7) JP
発明の名称 (英語) IRRADIATION METHOD OF LASER, FREQUENCY ADJUSTMENT METHOD OF PIEZOELECTRIC VIBRATOR USING SAME, AND FREQUENCY-ADJUSTED PIEZOELECTRIC DEVICE USING SAME
発明の概要(英語) Disclosed are an irradiation method of a laser, a frequency adjustment method of a piezoelectric vibrator using the same, and a frequency-adjusted piezoelectric device using the same capable of minimizing damage to silicon material or surrounding constituent elements, while the laser is transmitted through the silicon material and is irradiated preferably onto an object ahead of the same. Accordingly, as a laser to be used, a so-called "femtosecond laser" which is a pulse laser of a pulse width of 50 to 1000 fs (femtoseconds) is selected. This technology can, for example, preferably be used when irradiating a laser onto a piezoelectric vibrator contained in the interior of an electronic component package comprising silicon material to adjust the resonance frequency thereof.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • CITIZEN FINETECH MIYOTA CO.,LTD.
  • NATIONAL UNIVERSITY CORPORATION NAGAOKA UNIVERSITY OF TECHNOLOGY
  • 発明者(英語)
  • TADA, Kozo
  • ITO, Yoshiro
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)

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