TOP > 外国特許検索 > PHOTO-CATHODE HIGH-FREQUENCY ELECTRON-GUN CAVITY APPARATUS

PHOTO-CATHODE HIGH-FREQUENCY ELECTRON-GUN CAVITY APPARATUS 実績あり

外国特許コード F120006580
整理番号 S2010-0700
掲載日 2012年5月15日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2011JP071887
国際公開番号 WO 2012/043475
国際出願日 平成23年9月26日(2011.9.26)
国際公開日 平成24年4月5日(2012.4.5)
優先権データ
  • 特願2010-215840 (2010.9.27) JP
発明の名称 (英語) PHOTO-CATHODE HIGH-FREQUENCY ELECTRON-GUN CAVITY APPARATUS 実績あり
発明の概要(英語) A photo-cathode high-frequency electron-gun cavity apparatus of the present invention is provided with a high-frequency acceleration cavity (1), a photo cathode (8/15), a laser entering port (9), a high-frequency-power input coupler-port (10), and a high-frequency resonant tuner (16). The photo-cathode high-frequency electron-gun cavity apparatus is characterized in using an ultra-compact high-frequency acceleration cavity that has formed therein cavity cells that do not have any acute-angled sections on the inner face thereof, and that are formed with just smooth curved surfaces, in order to prevent discharging, make the high-frequency electric field higher in intensity, and improve the resonance stability of the high-frequency wave. Further, the photo cathode was formed at an end section of a half-cell (5) of the high-frequency acceleration cavity to maximize electric field strength at the photo-cathode face, the laser entering port was formed at the back of an electron-beam taking-out port of the high-frequency acceleration cavity, at a position opposing the photo cathode, to secure a perpendicular laser entrance to maximize the quality of short-bunch photoelectrons, and the high-frequency-power input coupler-port (10) was formed at a side section of a cell of the high-frequency acceleration cavity to intensify the electric field of the high-frequency wave. In such a way, a compact photo-cathode high-frequency electron-gun cavity apparatus that is able to generate high-intensity and high-quality electron beams became possible to be provided.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • INTER-UNIVERSITY RESEARCH INSTITUTE CORPORATION HIGH ENERGY ACCELERATOR RESEARCH ORGANIZATION
  • 発明者(英語)
  • URAKAWA, Junji
  • TERUNUMA, Nobuhiro
  • TAKATOMI, Toshikazu
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA(CONSENSUAL PATENT),BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),QA,RO,RS(PETTY PATENT),RU(UTILITY MODEL),RW(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),RW(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
ライセンスをご希望の方、特許の内容に興味を持たれた方は、下記「問合せ先」まで直接お問い合わせください。

PAGE TOP

close
close
close
close
close
close