TOP > 外国特許検索 > METHOD FOR PRODUCING POLYLACTIC ACID MICROPARTICLES, POLYLACTIC ACID MICROPARTICLES, AND CRYSTAL NUCLEATION AGENT, MOLDED ARTICLE, AND SURFACE MODIFIER USING THE SAME

METHOD FOR PRODUCING POLYLACTIC ACID MICROPARTICLES, POLYLACTIC ACID MICROPARTICLES, AND CRYSTAL NUCLEATION AGENT, MOLDED ARTICLE, AND SURFACE MODIFIER USING THE SAME

外国特許コード F120006615
整理番号 S2010-0409
掲載日 2012年5月16日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2011JP060469
国際公開番号 WO 2011/142283
国際出願日 平成23年4月28日(2011.4.28)
国際公開日 平成23年11月17日(2011.11.17)
優先権データ
  • 特願2010-108575 (2010.5.10) JP
発明の名称 (英語) METHOD FOR PRODUCING POLYLACTIC ACID MICROPARTICLES, POLYLACTIC ACID MICROPARTICLES, AND CRYSTAL NUCLEATION AGENT, MOLDED ARTICLE, AND SURFACE MODIFIER USING THE SAME
発明の概要(英語) Provided is a method for producing polylactic acid microparticles, which comprises: a preliminary step in which a polymer compound solution, which is obtained by dissolving in a first solvent a polymer compound containing structural units derived from l-lactic acid and structural units derived from d-lactic acid, is retained in a first liquid retaining part while a second solvent, which is a poor solvent of the polymer compound, is retained in a second liquid retaining part of a permeation device having two liquid retaining parts separated by a permeation membrane having pores with a diameter of 0.5 nm to 1,000 nm; and a permeation step in which the polymer compound solution retained in the first liquid retaining part is brought into contact with the second solvent by causing the polymer compound solution to permeate through the permeation membrane at a flow rate of 1 * 10-3 mL/(min.cm2) to 10,000 mL/(min.cm2).
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • NATIONAL UNIVERSITY CORPORATION GUNMA UNIVERSITY
  • 発明者(英語)
  • UEHARA, Hiroki
  • YAMANOBE, Takeshi
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA(CONSENSUAL PATENT),BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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