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CARBON MATERIAL FOR ELECTRIC DOUBLE LAYER CAPACITOR, METHOD FOR PRODUCING SAME, AND ELECTRIC DOUBLE LAYER CAPACITOR USING THE MATERIAL

外国特許コード F120006617
整理番号 S2010-0192
掲載日 2012年5月16日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2010JP068580
国際公開番号 WO 2011/142048
国際出願日 平成22年10月21日(2010.10.21)
国際公開日 平成23年11月17日(2011.11.17)
優先権データ
  • 特願2010-111962 (2010.5.14) JP
発明の名称 (英語) CARBON MATERIAL FOR ELECTRIC DOUBLE LAYER CAPACITOR, METHOD FOR PRODUCING SAME, AND ELECTRIC DOUBLE LAYER CAPACITOR USING THE MATERIAL
発明の概要(英語) Disclosed are: a carbon material for an electric double layer capacitor, which is capable of providing large capacity by high-voltage charging; a method for producing the carbon material; and an electric double layer capacitor using the carbon material. Also disclosed are: a carbon material for an electric double layer capacitor, which is capable of improving the electric double layer capacity in high-voltage charging; a method for producing the carbon material; and an electric double layer capacitor using the carbon material. Specifically disclosed is a carbon material for an electric double layer capacitor, which is characterized in that: the interplanar spacing (d002) of carbon hexagonal network planes as determined by X-ray diffraction is 0.355-0.370 nm; the crystallite size (Lc) of the network planes in the lamination direction is 1-2 nm; and the electrode bulk density is 0.8-0.9 g/cm3. Also specifically disclosed is an electric double layer capacitor comprising a polarizable electrode immersed in an electrolyte solution, which is characterized in that the polarizable electrode is formed using the above-described carbon material.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • NATIONAL UNIVERSITY CORPORATION GUNMA UNIVERSITY
  • 発明者(英語)
  • SHIRAISHI, Soshi
  • AJIMA, Daisuke
  • HAGIWARA, Rika
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA(CONSENSUAL PATENT),BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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