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POLYMER EXPANDED PARTICLE, EXPANDED TONER AND METHOD FOR PRODUCING POLYMER EXPANDED PARTICLE AND EXPANDED TONER

外国特許コード F120006629
整理番号 S2010-0641
掲載日 2012年5月17日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2011JP056372
国際公開番号 WO 2011/115203
国際出願日 平成23年3月17日(2011.3.17)
国際公開日 平成23年9月22日(2011.9.22)
優先権データ
  • 特願2010-060092 (2010.3.17) JP
発明の名称 (英語) POLYMER EXPANDED PARTICLE, EXPANDED TONER AND METHOD FOR PRODUCING POLYMER EXPANDED PARTICLE AND EXPANDED TONER
発明の概要(英語) Disclosed are a polymer expanded particle provided with a micropore, expanded toner and a method for producing the polymer expanded particle and expanded toner. Specifically disclosed is a polymer expanded particle characterized by being provided with a micropore with an average pore diameter of less than 50 micron m. Also disclosed is an expanded toner characterized by being provided with micropores with an average pore diameter of 1 micron m to less than 3 micron m and having a volume-average particle diameter of 5 micron m to less than 15 micron m. Also disclosed is a method for producing polymer expanded particles having a first step of mixing prescribed polymer particles and a high-pressure gas or supercritical fluid to create a mixture, a second step of impregnating the polymer particles with the high-pressure gas or supercritical fluid and a third step of reducing the pressure and temperature of the mixture and obtaining polymer expanded particles. The method for producing the polymer expanded particles is characterized by the pressure and temperature being reduced from a state of 20 MPa or greater and 60 deg.C or greater to a state of less than 1 MPa and less than 30 deg.C within five minutes in the third step.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • TOMOEGAWA CO., LTD.
  • National University Corporation Shizuoka University
  • 発明者(英語)
  • SANO, Takayuki
  • KONG, Chang Yi
  • ZHANG, Tao
  • OKAJIMA, Izumi
  • SAKO, Takeshi
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA,BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
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