TOP > 外国特許検索 > APPARATUS FOR PRODUCING MICRO LIQUID DROPS

APPARATUS FOR PRODUCING MICRO LIQUID DROPS

外国特許コード F120006648
整理番号 S2010-0954
掲載日 2012年5月17日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2011JP066004
国際公開番号 WO 2012/008497
国際出願日 平成23年7月13日(2011.7.13)
国際公開日 平成24年1月19日(2012.1.19)
優先権データ
  • 特願2010-158988 (2010.7.13) JP
発明の名称 (英語) APPARATUS FOR PRODUCING MICRO LIQUID DROPS
発明の概要(英語) The present invention provides an apparatus for producing micro liquid drops through fine channels which can produce a large amount of micro liquid drops at low costs in an efficient manner. The apparatus for producing micro liquid drops according to the present invention includes a fine channel substrate and a holder for holding the fine channel substrate. The fine channel substrate has a micro liquid drop discharge outlet formed at the center thereof; a plurality of micro liquid drop producing sections which are connected to the micro liquid drop discharge outlet via the fine channels and disposed on the respective circumference of M circles or polygons arranged around the micro liquid drop discharge outlet; first-liquid drawing inlets which are disposed on the circumference of a circle or polygon arranged around the micro liquid drop discharge outlet; up-to-Nth-liquid drawing inlets (N is an integer equal to two or greater, M <= N-1) which are disposed on the respective circumference of circles or polygons arranged sequentially outward; and the fine channels through which the first- to Nth-liquids are supplied to the plurality of micro liquid drop producing sections. The holder for holding the fine channel substrate has a multi-pipe structure which includes N annular channels for distributing an equal flow of the first- to Nth-liquids to the drawing inlet for each liquid in the fine channel substrate.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • Tokyo Institute of Technology
  • 発明者(英語)
  • NISISAKO, Takasi
国際特許分類(IPC)
指定国 AE(UTILITY MODEL),AG,AL(UTILITY MODEL),AM(PROVISIONAL PATENT)(UTILITY MODEL),AO(UTILITY MODEL),AT(UTILITY MODEL),AU,AZ(UTILITY MODEL),BA(CONSENSUAL PATENT),BB,BG(UTILITY MODEL),BH(UTILITY MODEL),BR(UTILITY MODEL),BW,BY(UTILITY MODEL),BZ(UTILITY MODEL),CA,CH,CL(UTILITY MODEL),CN(UTILITY MODEL),CO(UTILITY MODEL),CR(UTILITY MODEL),CU(INVENTOR'S CERTIFICATE),CZ(UTILITY MODEL),DE(UTILITY MODEL),DK(UTILITY MODEL),DM,DO(UTILITY MODEL),DZ,EC(UTILITY MODEL),EE(UTILITY MODEL),EG(UTILITY MODEL),ES(UTILITY MODEL),FI(UTILITY MODEL),GB,GD,GE(UTILITY MODEL),GH(UTILITY CERTIFICATE),GM,GT(UTILITY MODEL),HN(UTILITY MODEL),HR(CONSENSUAL PATENT),HU(UTILITY MODEL),ID,IL,IN,IS,JP(UTILITY MODEL),KE(UTILITY MODEL),KG(UTILITY MODEL),KM,KN,KP(INVENTOR'S CERTIFICATE)(UTILITY MODEL),KR(UTILITY MODEL),KZ(PROVISIONAL PATENT)(UTILITY MODEL),LA,LC,LK,LR,LS(UTILITY MODEL),LT,LU,LY,MA,MD(UTILITY MODEL),ME,MG,MK,MN,MW,MX(UTILITY MODEL),MY(UTILITY-INNOVATION),MZ(UTILITY MODEL),NA,NG,NI(UTILITY MODEL),NO,NZ,OM(UTILITY MODEL),PE(UTILITY MODEL),PG,PH(UTILITY MODEL),PL(UTILITY MODEL),PT(UTILITY MODEL),RO,RS(PETTY PATENT),RU(UTILITY MODEL),SC,SD,SE,SG,SK(UTILITY MODEL),SL(UTILITY MODEL),SM,ST,SV(UTILITY MODEL),SY,TH(PETTY PATENT),TJ(UTILITY MODEL),TM(PROVISIONAL PATENT),TN,TR(UTILITY MODEL),TT(UTILITY CERTIFICATE),TZ,UA(UTILITY MODEL),UG(UTILITY CERTIFICATE),US,UZ(UTILITY MODEL),VC(UTILITY CERTIFICATE),VN(PATENT FOR UTILITY SOLUTION),ZA,ZM,ZW,EP(AL,AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HR,HU,IE,IS,IT,LT,LU,LV,MC,MK,MT,NL,NO,PL,PT,RO,RS,SE,SI,SK,SM,TR),OA(BF(UTILITY MODEL),BJ(UTILITY MODEL),CF(UTILITY MODEL),CG(UTILITY MODEL),CI(UTILITY MODEL),CM(UTILITY MODEL),GA(UTILITY MODEL),GN(UTILITY MODEL),GQ(UTILITY MODEL),GW(UTILITY MODEL),ML(UTILITY MODEL),MR(UTILITY MODEL),NE(UTILITY MODEL),SN(UTILITY MODEL),TD(UTILITY MODEL),TG(UTILITY MODEL)),AP(BW(UTILITY MODEL),GH(UTILITY MODEL),GM(UTILITY MODEL),KE(UTILITY MODEL),LR(UTILITY MODEL),LS(UTILITY MODEL),MW(UTILITY MODEL),MZ(UTILITY MODEL),NA(UTILITY MODEL),SD(UTILITY MODEL),SL(UTILITY MODEL),SZ(UTILITY MODEL),TZ(UTILITY MODEL),UG(UTILITY MODEL),ZM(UTILITY MODEL),ZW(UTILITY MODEL)),EA(AM,AZ,BY,KG,KZ,MD,RU,TJ,TM)
詳しくお知りになりたい方は下記「問合せ先」まで直接お問合わせください

PAGE TOP

close
close
close
close
close
close